Methacrylate Derivatives of Carboxyl-Containing Polyimides: Synthesis and Photochemical Transformations

Vainer, A. Ya.; Dyumaev, K. M.; Likhachev, I. A.; Shalatonova, A. D.; Yartsev, Yu. A.

doi:10.1023/b:dopc.0000029167.69210.4c

Cited by 5 publications

(2 citation statements)

References 9 publications

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“…This explains the great interest of researchers to preparation of new types of photosensitive polymers for microelectronics [2][3][4][5][6][7][8]. We have solved this problem by polymerization of functionally substituted cyclopropyl styrenes [9][10][11].…”

Section: Introductionmentioning

confidence: 99%

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

Sadygova¹

2022

AChJ

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The radical copolymerization of (p-chlorophenoxycarbonyl)cyclopropyl styrene with styrene and methyl methacrylate has been carried out. New cyclopropane-containing copolymers have been obtained. It has been established that the synthesized copolymers due to peculiarities of their structure and polyfucntionality, namely with content of carbonyl and cyclopropane groups sensitive to UV irradiation in the macromolecule have photosensitivity. The constant values of relative activity of monomers have been determined and Q-e parameters on Alfrey and Price have been calculated. The copolymerization constants of this compound (r1) with styrene and methyl methacylate (r2), calculated on Fineman-Ross method are: r1 = 1.1 and1.05, but r2 = 0.56 and 0.48, respectively; Q and e parameters values: Q1 = 3.1 and 2.4, e1 = –1.4 and –0.8, respectively. The photochemical structuring has been investigated and it has been shown that the structuring process proceeds due to of cyclopropane ring opening and carbonyl group. The composition and structure of these copolymers have been established and their some characteristics (heat resistance, hardness, adhesive strength, water absorption) have been investigated. The structuring process has been also studied and it has been established that the synthesized copolymer has relatively high photosensitivity (50–55 cm2J-1)

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Section: Introductionmentioning

confidence: 99%

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

Sadygova¹

2022

AChJ

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“…This fact accounts for strong researchers' interest in preparation of new types of photosensitive materials for use in microelectronics [2][3][4][5][6][7][8]. The route to the new materials is synthesis and polymerization of functionally substituted cyclopropylstyrenes [9][10][11][12].…”

mentioning

confidence: 99%

Copolymerization of (p-Vinylphenyl)cyclopropylmethyl cinnamate with styrene

et al. 2014

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Radical copolymerization of (p-vinylphenyl)cyclopropylmethyl cinnamate with styrene was studied. A new cyclopropane-containing photosensitive copolymer was prepared. The composition and structure of the synthesized copolymer and the relative activity constants of the monomers were determined, and the Q-e parameters were calculated. The dependence of the photosensitivity on the copolymer composition was revealed.

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Synthesis of 2-Chloromethyl-1-(p-vinylphenyl)cyclopropane and Its Copolymerization with Styrene

et al. 2018

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Methacrylate Derivatives of Carboxyl-Containing Polyimides: Synthesis and Photochemical Transformations

Cited by 5 publications

References 9 publications

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

Copolymerization of (p-Vinylphenyl)cyclopropylmethyl cinnamate with styrene

Synthesis of 2-Chloromethyl-1-(p-vinylphenyl)cyclopropane and Its Copolymerization with Styrene

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