ISPSD '03. 2003 IEEE 15th International Symposium on Power Semiconductor Devices and ICs, 2003. Proceedings.
DOI: 10.1109/ispsd.2003.1225295
|View full text |Cite
|
Sign up to set email alerts
|

Method for electrical detection of bond wire lift-off for power semiconductors

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
36
0

Publication Types

Select...
5
4

Relationship

0
9

Authors

Journals

citations
Cited by 40 publications
(36 citation statements)
references
References 2 publications
0
36
0
Order By: Relevance
“…During tests, bonding wire liftoff can be electrically detected by measuring V CE,sat under low IC conditions [65]- [67]. The criterion to detect bond-wire failure was a +5% increment of V CE,sat [15], [68].…”
Section: Package-related Failure Mechanismsmentioning
confidence: 99%
“…During tests, bonding wire liftoff can be electrically detected by measuring V CE,sat under low IC conditions [65]- [67]. The criterion to detect bond-wire failure was a +5% increment of V CE,sat [15], [68].…”
Section: Package-related Failure Mechanismsmentioning
confidence: 99%
“…Representing a power device generating high temperature, two commercial SMD type resistors are used as a heat source (each size: 6.4mm × 3.2mm × 0.5mm). The total size of the two resistors is identical with the dimension of real IGBT devices [19,21].…”
Section: A Fabrication Of the Simplied Power Modulementioning
confidence: 99%
“…Temperature elevation increases the resistor value, and sequentially changes current passing through the resistors. Also, the resistor can detect wire bond lift-off [19] or unbalanced device currents [20,21]. This method provides in-situ and real-time measurements with minor modifications in module design.…”
Section: Introductionmentioning
confidence: 99%
“…Assuming a homogeneous temperature within the power die, the drift region resistance R N−_cell can be considered constant for all elementary cells. However, for these conditions, the channel resistance R CH_cell of the elementary cells depends solely on the voltage between gate and source (V GS ) of each elementary cell (6). In fact, variations in the electric potential mapping of the source metallization (Figs.…”
Section: A Vertical Resistance Distribution In Power Diesmentioning
confidence: 99%