Mevva ion source operated in purely gaseous mode

Yushkov, G. Yu.; MacGill, R.A.; Brown, Ian

doi:10.1063/1.1691474

Cited by 13 publications

(3 citation statements)

References 12 publications

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“…The ions that are accelerated in the cathode voltage drop region V c are able to leave the hollow cathode via the apertures in the walls of the cathode. In most cases the output ion flow is additionally accelerated by means of special perforated electrodes to which an external voltage is applied [33,34,[43][44][45][46].…”

Section: Typical Systems For Obtaining Low-pressure Dischargesmentioning

confidence: 99%

Low-pressure discharges with hollow cathode and hollow anode and their applications

Korolev¹,

Koval²

2018

J. Phys. D: Appl. Phys.

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The review relates to low-pressure discharges with a hollow cathode and a hollow anode. The term ‘low pressure’ implies that a neutral particle density is extremely small and the electron free path for ionization is in excess of the characteristic size for the discharge gap. On the other hand, the neutral particles still play an essential role in forming the gas-discharge plasma. Thus, the discharge regimes keep an intermediate position between the classical low-pressure discharge with avalanche ionization and pure vacuum discharge that burns in the cathode metal vapor. New approaches to the interpretation of the discharge formation mechanism at the stage of delay time to breakdown, and for the discharge sustaining features at the later temporal stages, are discussed. The developed approaches offer the possibility of interpreting the discharge behavior in the systems to obtain a uniform plasma in a large volume of the cathode or anode cavity, in the sources of electron and ion beams based on the plasma cathode and in the high-current pseudospark switches.

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Section: Typical Systems For Obtaining Low-pressure Dischargesmentioning

confidence: 99%

Low-pressure discharges with hollow cathode and hollow anode and their applications

Korolev¹,

Koval²

2018

J. Phys. D: Appl. Phys.

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“…In work related to accelerator injection, a vacuum arc ion source was used to provide Mg + ions for injection into the GSI heavy ion accelerator, having increased the ion source gas pressure so as to maximize the fraction of singly-charged ions with respect to the doubly-charged Mg 2+ fraction [39]. A way of operating a vacuum arc source in a 100% gaseous mode has been reported [40]. In this case the vacuum arc feature is not used at all, but instead a hollow cathode glow discharge is formed in the same ion source geometry.…”

Section: Gaseous Operationmentioning

confidence: 99%

Vacuum arc ion sources: recent developments and applications

Brown

Окс

2005

IEEE Trans. Plasma Sci.

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The vacuum arc ion source has evolved over the past twenty years into a standard laboratory tool for the production of high current beams of metal ions, and is now used in a number of different embodiments at many laboratories around the world. The primary application of this kind of source has evolved to be ion implantation for material surface modification. Another important use is for injection of high current beams of heavy metal ions into the front ends of particle accelerators, and much excellent work has been carried out in recent years in optimizing the source for reliable accelerator application. The source also provides a valuable tool for the investigation of the fundamental plasma physics of vacuum arc plasma discharges. As the use of the source has grown and diversified, at the same time the ion source performance and operational characteristics have been improved in a variety of different ways also. Here we review the growth and status of vacuum arc ion sources around the world, and summarize some of the applications for which the sources have been used. _________________________Index Terms -Ion source, vacuum arc, cathode spot, metal ion beam, ion implantation 1

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“…This implantation facility operates in a repetitively pulsed mode with repetition rate 10 same ion source but somewhat modified to form a hollow cathode glow discharge mode [20].…”

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confidence: 99%

Surface Property Modification of Polylactic Acid by Ion Implantation

Васенина¹,

Savkin²,

Laput³

et al. 2017

Preprint

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Abstract:We describe our investigations of the surface physicochemical and biological properties 9 of polylactic acid modified by silver, argon and carbon ion implantation to doses of 1 × 10 14 , 1 × 10 15 10 and 1 × 10 16 ion/cm 2 at energies of 20 keV (for C and Ar) and 40 keV (for Ag). X-ray analysis shows 11 enhancement of coherent scattering regions and lattice constant increase after ion implantation. 12Secondary electron mass-spectrometry indicates that Ag concentration in the subsurface layer is 13 less than 80%, but at a depth of 500 nm does not exceed 1-2%. The silver forms metal particles in

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Mevva ion source operated in purely gaseous mode

Cited by 13 publications

References 12 publications

Low-pressure discharges with hollow cathode and hollow anode and their applications

Low-pressure discharges with hollow cathode and hollow anode and their applications

Vacuum arc ion sources: recent developments and applications

Surface Property Modification of Polylactic Acid by Ion Implantation

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