Micro-machining of resists on silicon by proton beam writing

Uchiya, N.; Harada, Toshiro; Murai, Masato; Nishikawa, Hiroyuki; Haga, J.; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro

doi:10.1016/j.nimb.2007.02.053

Cited by 48 publications

(24 citation statements)

References 23 publications

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“…Using these unique features of PBW, micromachining of resist with a thickness of up to 50 lm,has been demonstrated. (Springham et al 1997a, b;Uchiya et al 2007) In this paper, we report electroplating of a Ni structure on the micro-machined PMMA by PBW. The microstructure of PMMA and Ni were evaluated by scanning electron microscope (SEM).…”

Section: Introductionmentioning

confidence: 75%

“…The proton beam writing was carried out with the resolution of approximately 3,500 9 3,500 pixels in the area of 300 9 300 lm by electrostatic deflection without using beam blanking system (Sakai et al 2002(Sakai et al , 2005van Kan et al 2001). The fluence of protons is varied from 60 to 100 nC/mm 2 (Uchiya et al 2007;van Kan et al 1999b). After the PBW, the PMMA samples were developed with IPA-water (7:3) for 20 min and rinsed in deionized water (Ansari et al 2004).…”

Section: Methodsmentioning

confidence: 99%

“…These data indicate that the micromachined PMMA by PBW can be used as a template for the electroplating. Coupled with the capability of the PBW for structures with high aspect ratio up to 20 (Uchiya et al 2007), the PBW can be a promising tool for making molds with high aspect ratio for imprint lithography process (Hirai et al 2002;Heidari et al 2000;Pfeiffer et al 2002;Taniguchi et al 2002;Schulz et al 2000;Guo 2004).…”

Section: Methodsmentioning

confidence: 99%

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Ni electroplating on a resist micro-machined by proton beam writing

et al. 2008

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In this paper we report fabrication of highaspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 lm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.

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Section: Introductionmentioning

confidence: 75%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Ni electroplating on a resist micro-machined by proton beam writing

et al. 2008

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“…In this study, we create patterned microstructures between dense micro-protrusions on the FEP surfaces using 3 MeV proton beam writing (PBW) and subsequent 250 keV nitrogen ion beam irradiation. PBW is a direct writing process using a MeV focused proton beam [7][8][9][10][11][12]. It is usually applied in three-dimensional nanofabrication as a maskless lithographic technique [7].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Micropatterns on Teflon Surface by Proton Beam Writing and Nitrogen Ion Beam Irradiation

Kitamura

Satoh

Koka

et al. 2013

Trans. Mat. Res. Soc. Japan

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Polytetrafluoroethylene (PTFE) and fluorinated ethylene propylene (FEP) are well known as Teflon®. Synchrotron radiation and focused ion beam irradiation are effective techniques for fabricating microstructures on the surfaces of Teflon. In this study, we created micro-patterns between micro-protrusions on FEP surfaces by using a combination of 3 MeV proton beam writing (PBW) and subsequent 250 keV nitrogen ion beam irradiation. First, we found that the proton microbeam made bubbles inside FEP samples. After their samples were irradiated with the nitrogen ion beam, dense micro-protrusions were formed on the surfaces other than the upper parts above the bubbles. Instead, the parts became smooth or depressed along the patterns of PBW. Thus, a microfabrication of Teflon was demonstrated by using two different ion beam irradiation.

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“…Secondly, the projected range of the protons can be controlled with the beam energy. It is useful for the fabrication of high aspect ratio structures and prototyping of devices [6][7][8] .…”

Section: Introductionmentioning

confidence: 99%

Fabrication of silica-based three-dimensional structures by changing fluence using proton beam writing

Tsuchiya

Nishikawa

2011

Trans. Mat. Res. Soc. Japan

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We performed micromachining of relatively thick siloxane films by proton beam writing (PBW) with beam energy of 1 MeV. The polydimethylsiloxane (PDMS) prepolymer films with a thickness of about 13 m were spin-coated onto silicon substrates. After exposure to the 1-MeV proton beam (~1 m in diameter), the samples were developed. The PDMS shows the behavior of negative resist and can be regarded as analog resist where the thickness of the structure gradually increases as a function of the proton beam (PB) fluence. Using this feature of the PDMS, we manufactured micro lenses with diameter of 40 m by changing PB fluence. Micro-patterning of the PDMS films using scanning proton beam can offer a possibility of making three-dimensional structures for silica-based devices without baking and mask process.

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Micro-machining of resists on silicon by proton beam writing

Cited by 48 publications

References 23 publications

Ni electroplating on a resist micro-machined by proton beam writing

Ni electroplating on a resist micro-machined by proton beam writing

Fabrication of Micropatterns on Teflon Surface by Proton Beam Writing and Nitrogen Ion Beam Irradiation

Fabrication of silica-based three-dimensional structures by changing fluence using proton beam writing

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