Micro-/Nanofabrication of Cross-linked Poly(L-lactic acid) Using Electron Beam Nanoimprint Lithography

Okubo, Susumu; Nagasawa, Naotsugu; Kobayashi, Akinobu; Oyama, Tomoko Gowa; Taguchi, Mitsumasa; Oshima, Akira; Tagawa, Seiichi; Washio, Masakazu

doi:10.1143/apex.5.027303

Cited by 4 publications

(3 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The evolutions of T g and T m shown in Figure 1E make it clear that PLLA and TAIC are thermodynamically miscible blends. According to our analysis of the SEM and DSC results, the miscibility between PLLA and TAIC is confirmed, which agrees with results previously reported in the literature [29][30][31][32]. This will be the basis for the following investigation of inclusion and exclusion behaviors of TAIC during the crystallization of PLLA.…”

Section: Resultssupporting

confidence: 91%

Inclusion/Exclusion Behaviors of Small Molecules during Crystallization of Polymers in Miscible PLLA/TAIC Blend

et al. 2022

View full text Add to dashboard Cite

In this work, PLLA/TAIC has been taken as a model system to investigate the inclusion and exclusion of small molecules during the crystallization of polymers in their miscible blend. Our results indicate that it is the growth rate and diameter of PLLA spherulites that dominate the localization of TAIC. On the one hand, crystallization temperature plays an important role. Crystallization at higher temperature corresponds to higher growth rates and a greater diameter of PLLA spherulites. The former improves the ability of PLLA crystals to trap TAIC while the latter leads to a lower volume fraction of space among neighboring PLLA spherulites. The combination of the two contributes to the enhanced inclusion behaviors. On the other hand, when compared to melt crystallization, cold crystallization results in much smaller spherulites (from higher nucleation density) and sufficient space among spherulites, which accounts for the enrichment of TAIC in interspherulitic regions and for its enhanced exclusion. In the adopted polymer–small molecule blend, TAIC can enrich in interspherulitic regions even in its miscible blend with PLLA, which can be attributed to its stronger diffusion ability.

show abstract

Section: Resultssupporting

confidence: 91%

Inclusion/Exclusion Behaviors of Small Molecules during Crystallization of Polymers in Miscible PLLA/TAIC Blend

et al. 2022

View full text Add to dashboard Cite

show abstract

“…E-beam lithography (EBL) is a widely used patterning technique for nanofabrication in industry and academy, for its capability of high-resolution patterning and controllability without a mask [36][37][38]. However, there is the fact that a manufactured pattern differs from the one input to the EBL software.…”

Section: Introductionmentioning

confidence: 99%

The fabrication of nanostructures with a large range of dimensions and the potential application for light outcoupling in organic light-emitting diodes

Shi

Gao

et al. 2019

J. Micromech. Microeng.

View full text Add to dashboard Cite

The fabrication of a nanostructure with a size of hundreds of nanometers down to sub-20 nm is investigated and demonstrated by e-beam lithography (EBL). The proximity effect influenced by the exposure dose during EBL is explored and analyzed for both pillar and grating patterns with positive and negative photoresist. By good control of the proximity effect and etching process, grating patterns from hundreds of nanometers down to about 20 nm are obtained. Furthermore, a pillar structure with a size down to sub-20 nm is achieved by annealing treatment of the photoresist hydrogen silsesquioxane at 400 °C without any further etching process. These nanostructures show great potential for efficiency enhancement of organic light-emitting diodes (OLEDs). The finite element analysis demonstrates there is the possibility of enhancing the external quantum efficiency of OLEDs peaking at 510 nm by a factor of 1.4. Such a high enhancement factor can only be achieved with finely controlled nanostructures, indicating the importance of size control during nanofabrication.

show abstract

“…Moreover, it does not need any requirements, as is the case of UV-NIL, for the mold materials [8,9].…”

Section: Introductionmentioning

confidence: 99%

Transparent Crosslinked PTFE Mold Fabrication and Nano- /Micro-Pattern Transfer to Photo-Curable Resin

Kobayashi

Oyama

Oshima

et al. 2012

J. Photopol. Sci. Technol.

Self Cite

View full text Add to dashboard Cite

Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole ( 170 nm) array patterns were clearly obtained.

show abstract

Micro-/Nanofabrication of Cross-linked Poly(L-lactic acid) Using Electron Beam Nanoimprint Lithography

Cited by 4 publications

References 6 publications

Inclusion/Exclusion Behaviors of Small Molecules during Crystallization of Polymers in Miscible PLLA/TAIC Blend

Inclusion/Exclusion Behaviors of Small Molecules during Crystallization of Polymers in Miscible PLLA/TAIC Blend

The fabrication of nanostructures with a large range of dimensions and the potential application for light outcoupling in organic light-emitting diodes

Transparent Crosslinked PTFE Mold Fabrication and Nano- /Micro-Pattern Transfer to Photo-Curable Resin

Contact Info

Product

Resources

About