Micro-pinch formation and extreme ultraviolet emission of laser-induced discharge plasma*

Abstract

Extreme ultraviolet (EUV) source produced by laser-induced discharge plasma (LDP) is a potential technical means in inspection and metrology. A pulsed Nd:YAG laser is focused on a tin plate to produce an initial plasma thereby triggering a discharge between high-voltage electrodes in a vacuum system. The process of micro-pinch formation during the current rising is recorded by a time-resolved intensified charge couple device camera. The evolution of electron temperature and density of LDP are obtained by optical emission spectrometry. An extreme ultraviolet spectrometer is built up to investigate the EUV spectrum of Sn LDP at 13.5 nm. The laser and discharge parameters such as laser energy, voltage, gap distance, and anode shape can influence the EUV emission.

Simulation of extreme ultraviolet radiation of laser induced discharge plasma

“…本节采用Z* code对激光诱导固体锡靶放电 实验 [34] 进行模拟, 模拟条件和实验条件一致: 放电 电压-7. 电流半周期内等离子体未能形成有效箍缩, 整体等 离子体尺寸太大, EUV的辐射损耗高 [35] ; 2)光辐 射总功率和EUV辐射功率出现峰值的时刻并不重 合: 辐射总功率峰值出现在电流达到峰值后, 而 EUV辐射功率的峰值出现在电流上升期间, 这与 之前的实验结论吻合 [34] . 在传统的Z箍缩研究中,…”