2017
DOI: 10.1016/j.surfcoat.2017.04.064
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Micro-structures and growth mechanisms of plasma electrolytic oxidation coatings on aluminium at different current densities

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Cited by 71 publications
(28 citation statements)
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“…The outer layers are denser than the highly porous intermediate layers. This might be due to solidification and oxidation of the molten substrate ejected from underneath the forming porous oxide during the PEO [ 24 , 25 , 26 ]. This intermediate sublayer was especially thin for the Ca1P2 400 V sample ( Figure 2 c), when compared with those obtained from the Ca5P3 ( Figure 2 f) and (CaMg)5P3 ( Figure 2 i) electrolytes.…”
Section: Resultsmentioning
confidence: 99%
“…The outer layers are denser than the highly porous intermediate layers. This might be due to solidification and oxidation of the molten substrate ejected from underneath the forming porous oxide during the PEO [ 24 , 25 , 26 ]. This intermediate sublayer was especially thin for the Ca1P2 400 V sample ( Figure 2 c), when compared with those obtained from the Ca5P3 ( Figure 2 f) and (CaMg)5P3 ( Figure 2 i) electrolytes.…”
Section: Resultsmentioning
confidence: 99%
“…The strong discharge with a subsequent current drop resulted in the growth of a dielectric porous outer layer 6.86 ± 1.03 µm in thickness 22 . According to Zhang et al 23 , during the formation of the outer porous layer a much lower voltage drop occurs than when the inner layer is forming. This can be explained by the much lower resistance of the outer porous layer in comparison with the compact inner layer.…”
Section: Resultsmentioning
confidence: 99%
“…From reference [ 39 ], a passivation layer with a thickness of 6–20 nm can be formed on the exposed silicon crystals via chemisorption. A natural oxide layer on aluminium matrix, which is composed of amorphous Al 2 O 3 with a thickness of 2–3 nm, also exists before passivation [ 6 , 41 , 42 ]. In the passivation stage, both of them will grow thicker and reach 10–15 nm by anodizing oxidation, as shown in figure 7 a .…”
Section: Discussionmentioning
confidence: 99%