Microcavity plasma devices and arrays: a new realm of plasma physics and photonic applications

Abstract

The confinement of low temperature, non-equilibrium plasmas to cavities having characteristic spatial dimensions <1 mm is providing new avenues of inquiry for plasma science. Not only is a previously unexplored region of parameter space now accessible, but the interaction of the plasma with its material boundaries raises fascinating questions and opportunities. Other scientific issues that come to the fore include scaling relationships and the collisional processes that become prevalent in a high pressure environment. The general characteristics of microplasmas, as well as several emerging applications, are briefly described here. With regard to the latter, emphasis will be placed on photonics and, specifically, the demonstration of large (500 ×500) arrays of microcavity plasma devices in Si, the observation of photodetection in the visible, near-infrared and ultraviolet by a microplasma, and the measurement of optical gain in the blue (λ ∼ 460 nm) from a linear array of microplasmas in a ceramic structure.

Spatial dynamics of the light emission from a microplasma array

“…The microplasma arrays investigated in this letter are well suited for a variety of applications, e.g., plasma display panels, photodetectors, UV sources, etc. 8,9 The electrical characteristics of such arrays have been well described by current voltage measurements. [10][11][12] A recent approach to model a single microdischarge of an array operated in dc mode has been made by Kushner.…”

Investigation of the structure of wear resistant coatings obtained by plasma powder surfacing

“…It can be explained both by a smaller transition coefficient of such alloying elements [8] as carbon and chromium and by a considerable overheating of the molten bath and lower speed of its crystallization. The mentioned processes result in the crystallization of coating, which moves by thalweg in the direction of under eutectic structures [12]. Raising arc pressure when surfacing at amperage 180 A leads to strong metal base melting and its penetration to the weld metal.…”

Translation of plasma technology from the lab to the food industry

“…[34,35] Microdischarge devices which operate at atmospheric pressure are gaining increased attention, primarily due to the significant cost reduction for processing compared with their low pressure counterparts. [35] Such designs may also suit scale-up for large volume food treatments through homogeneous large area treatment and could be particularly suited for continuous processing conditions. However, micro-plasma array structures can have significant fluxuations compared to the discharges generated by larger and more confining structures.…”