The Physics of Micro/Nano-Fabrication 1992
DOI: 10.1007/978-1-4757-6775-9_6
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Microcharacterization

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Cited by 4 publications
(6 citation statements)
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“…As the spatial resolution of human eyesight is about 200 μm (ref. 32 ) the smallest visible area ∼200 μm × 200 μm or 0.04 mm 2 . Thus, the spot area of 0.09 mm 2 obtained from a 1 nA current after 5 min is visible to the naked eye.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…As the spatial resolution of human eyesight is about 200 μm (ref. 32 ) the smallest visible area ∼200 μm × 200 μm or 0.04 mm 2 . Thus, the spot area of 0.09 mm 2 obtained from a 1 nA current after 5 min is visible to the naked eye.…”
Section: Resultsmentioning
confidence: 99%
“…This is too small to be easily visible to the naked eye as the spatial resolution of human eyesight is ∼100–200 μm (ref. 32 ).…”
Section: Resultsmentioning
confidence: 99%
“…The expression for force obtained from the Green function is originally a linear combination of terms with different powers of ω ΛvF and, thus, the dominant term is the one with the smallest exponent, which explains the choice of α as the minimum of α 1 and α 2 in eq. (9).…”
Section: Non-chiral Bosonization Techniquementioning
confidence: 99%
“…The presence of an impurity can bring drastic changes to interacting systems, especially if the systems are one dimensional [7], whose physics is quite different from higherdimensional systems, better described by the Luttinger liquid model [8]. With the advancement in micro/nanofabrication [9], which has made the realization of 1D systems practical, there has been a growing interest towards problems concerned with the Tomonaga Luttinger (TL) liquids, the problem of an impurity in a TL liquid being one of them. The transport properties of TL liquids with localized impurities have been rigorously studied using bosonization, renornmalization group and other theoretical tools [7,10,11].…”
mentioning
confidence: 99%
“…As already pointed out, evolvement of manufacturing technologies for nanoelectronics and MEMS devices for advanced computing and sensing applications represents significant challenges [19,20]. Modeling and simulation of the fabrication processes, extensively used by the microelectronics industry, offer significant advantages in meeting these challenges [21][22][23][24][25].…”
Section: Introductionmentioning
confidence: 99%