2014
DOI: 10.1016/j.egypro.2013.12.029
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Microcrystalline SiGe Absorber Layers in Thin-film Silicon Solar Cells

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Cited by 6 publications
(6 citation statements)
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“…This was found to stay in good accordance to EDX measurements of μc-SiGe:H films [9]. The optimal germanium content in μc-SiGe:H i-layers was found to be 10% because incorporating more germanium leads to the formation of acceptor like states induced by germanium dangling bond defects that decrease the solar cell performance [10].…”
Section: Methodssupporting
confidence: 69%
“…This was found to stay in good accordance to EDX measurements of μc-SiGe:H films [9]. The optimal germanium content in μc-SiGe:H i-layers was found to be 10% because incorporating more germanium leads to the formation of acceptor like states induced by germanium dangling bond defects that decrease the solar cell performance [10].…”
Section: Methodssupporting
confidence: 69%
“…The graph clearly shows the higher current density values of the proposed SiGe solar cell are ∼16% higher as compared to crystalline silicon solar cell. The observed J sc and efficiency are also much better as compared to previously reported work [13][14][15]25]. Hence, lower band gap and enhanced absorption by SiGe layer at longer wavelengths have been advantageously combined to improve the PV performance of the device.…”
Section: Resultsmentioning
confidence: 61%
“…The motivation lies within the fact that SiGe alloys exhibited higher absorption coefficient in the nearinfrared portion of sunlight spectrum [13]. Several groups have reportedly fabricated and characterised SiGe solar cells with different SiGe thickness; Liu et al [13] observed 0.75% efficiency for 5 µm SiGe layer, Maydell et al [14] reported 5.5% efficiency, Wang et al [15] observed 14.3%, and Diaz et al [16] recorded 18.9% efficiencies for SiGe-based solar cells developed on silicon. Similarly, solar cells fabricated on thinner silicon substrates have also been reported that offer exciting potential for fabricating the efficient and cost-effective thin-film silicon solar cells [17].…”
Section: Introductionmentioning
confidence: 99%
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“…The most popular techniques for the controlled synthesis of thin layers and nanostructures of Si 1– x Ge x include molecular beam epitaxy using the elements as sources and the thermal decomposition of SiH 4 /GeH 4 mixtures in chemical vapor deposition (CVD). , In addition, alternative precursors for CVD synthesis such as higher silanes and dichlorosilane , are reported. Crystal growth of Si 1– x Ge x on Si surfaces also includes the formation of nanodots accompanied by complex bulk and surface diffusion, leading to specific morphologies .…”
Section: Introductionmentioning
confidence: 99%