Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Xie, Xian Ning; Chung, Hong Jing; Sow, Chorng Haur; Wee, Andrew Thye Shen

doi:10.1002/adfm.200600439

Cited by 9 publications

(5 citation statements)

References 44 publications

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“…At proper tip bias and pulse duration, negative nanostructures can be fabricated by field-assisted Si dissolution, just like the experiment performed in dilute hydrofluoride liquid thin layer. 29 That was the results observed under −8 0 V tip bias and 0.1 s pulse duration. When the pulse duration exceeds the threshold value, the silicon oxide produced by anodic oxidation in the later stage of the lithography process accumulates to form positive patterns after fluorine ions used up (longer pulse duration in Fig.…”

Section: Resultssupporting

confidence: 66%

In-Situ Negatively Nanopatterning Alkylated Silicon (111) Surface by Conductive Atomic Force Microscope

Wang

Zhang²,

Tian³

et al. 2009

j nanosci nanotechnol

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Negative nanopatterns have been successfully in-situ fabricated on tetradecylated Si(111) surface via bias-dependent atomic force microscopy (AFM) lithography without wet chemical etching procedures. Alkyl self-assembled monolayers (SAMs) made of 1-tetradecene coupled to hydride-terminated Si(111) surface through robust silicon-carbon covalent bonds was employed as a resist layer. The SAM covered silicon substrate was then treated with dilute hydrofluoride, and subsequent used in AFM lithography. By varying the applied bias and pulse duration, both negative and positive patterns can be fabricated via this approach, such as Si pores and oxide dots. The results indicated that the HF-ethanol treatment of SAMs plays an important role in forming negative nanopatterns in situ. In particular, the Si pore structure formation was related to the reaction between F-buried inside the SAM and silicon substrate under the effect of tip electric field. A possible mechanism of Si pore formation based on the reaction of F- ions with silicon induced by the tip bias was proposed.

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Section: Resultssupporting

confidence: 66%

In-Situ Negatively Nanopatterning Alkylated Silicon (111) Surface by Conductive Atomic Force Microscope

Wang

Zhang²,

Tian³

et al. 2009

j nanosci nanotechnol

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“…The formation of negative patterns in Figure can be reasonably explained by the removal of the adsorbed HDT molecules with the application of negative bias since the gold−sulfur bond was broken in a cathodic process as has been proved in the bias-assisted nanolithography. , As for the big difference between the depth of the negative patterns and the thickness of HDT monolayers (∼2.06 nm), it may be attributed to the adsorption of unremoved HDT molecules and contaminants (from reaction residual or air) onto the fresh gold because of the high surface energy of such fresh gold and some extent deformation of the surrounding HDT SAMs under the load of the tip . Recently, Xie et al reported the formation of positive and negative nanopatterns on silicon first by formation of microscale droplets via dilute hydrofluoride etching, then conversion of the droplets to acidic thin layers by AFM probe scanning, and then subsequent fabrication using bias-assisted nanolithography in the aqueous layers . The process is not reversible.…”

Section: Resultsmentioning

confidence: 60%

“…7 Recently, Xie et al reported the formation of positive and negative nanopatterns on silicon first by formation of microscale droplets via dilute hydrofluoride etching, then conversion of the droplets to acidic thin layers by AFM probe scanning, and then subsequent fabrication using bias-assisted nanolithography in the aqueous layers. 17 The process is not reversible.…”

Section: Simultaneous Fabrication Of Positive and Negativementioning

confidence: 99%

Reversible Nanopatterning on Self-Assembled Monolayers on Gold

2008

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The reversible fabrication of positive and negative nanopatterns on 1-hexadecanethiol (HDT) self-assembled monolayers (SAMs) on Au(111) was realized by bias-assisted atomic force microscopy (AFM) nanolithography using an ethanol-ink tip. The formation of positive and negative nanopatterns via the bias-assisted nanolithography depends solely on the polarity of the applied bias, and their writing speeds can reach 800 μm/s and go beyond 1000 μm/s, respectively. The composition of the positive nanopatterns is gold oxide and the nanometer-scale gold oxide can be reduced by ethanol to gold, as proved by X-ray photoelectron spectroscopy (XPS) analysis, forming the negative nanopatterns which can be refilled with HDT to recover the SAMs. The inked material of ethanol acts as a reductant which is transferred to the substrate for the local chemical reactions like that in dip-pen nanolithography (DPN). The negative nanopatterns can be used as templates, for example, for the immobilization of magnetic nanoparticles. Interestingly, we found that the nanometer-scale gold oxide was very stable on hydrophobic HDT/Au(111) in air, whereas on hydrophilic SAMs it decomposed soon and resulted in the formation of the negative nanopattern. In addition, the effect of bias on the nanolithography was investigated.

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“…Kinser et al performed anodic oxidation under organic solvents in order to tune the polarity of the surrounding liquid and thereby control the size of the meniscus [549,550]. Other solvents can also promote localized oxidation of a Si surface, such as dilute (0.05-1.0%) hydrofluoric acid (HF) [551,552]. Self-assembled monolayers have also been used as positive and negative tone resists for this SPL [553].…”

Section: Anodic Oxidationmentioning

confidence: 99%

Hybrid strategies in nanolithography

et al. 2010

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Hybrid nanoscale patterning strategies combine the registration and addressability of conventional lithographic techniques with the chemical and physical functionality enabled by intermolecular, electrostatic and/or biological interactions. This review aims to highlight and to provide a comprehensive description of recent developments in hybrid nanoscale patterning strategies that enhance existing lithographic techniques or can be used to fabricate functional chemical patterns that interact with their environment. These functional structures create new capabilities, such as the fabrication of physicochemical surfaces that can recognize and capture analytes from complex liquid or gaseous mixtures. The nanolithographic techniques we describe can be classified into three general areas: traditional lithography, soft lithography and scanning-probe lithography. The strengths and limitations of each hybrid patterning technique will be discussed, along with the current and potential applications of the resulting patterned, functional surfaces.

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Microdroplet and Atomic Force Microscopy Probe Assisted Formation of Acidic Thin Layers for Silicon Nanostructuring

Cited by 9 publications

References 44 publications

In-Situ Negatively Nanopatterning Alkylated Silicon (111) Surface by Conductive Atomic Force Microscope

In-Situ Negatively Nanopatterning Alkylated Silicon (111) Surface by Conductive Atomic Force Microscope

Reversible Nanopatterning on Self-Assembled Monolayers on Gold

Hybrid strategies in nanolithography

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