Microfabrication of a Diffractive Microlens Array on n‐GaAs by an Efficient Electrochemical Method

Zhang, Li; Z., Xin; Zhuang, Jin Liang; Qiu, Chuan K.; Du, Chun L.; Tang, Jing; Zhao, Tian

doi:10.1002/adma.200700300

Cited by 46 publications

(37 citation statements)

References 32 publications

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“…57 The problem of diffusional shielding of individual electrodes was solved for a confined etchant layer technique by periodically renewing the solution between probes and sample and limiting the extension of the diffusion layer with a homogeneous scavenger reaction. 58 Barker et al reported a multielectrode for parallel SECM imaging that comprised a linear array of 16 individually addressable microelectrodes placed on a planar insulating chip. 59 10 μm diameter Pt microelectrodes were prepared by laying a nanometer-thick Pt layer over an insulating silicon nitride film, followed by the application of a second thin nitride film.…”

Section: ' Secm Scanning With Multiplexed Probesmentioning

confidence: 99%

Seeing Big with Scanning Electrochemical Microscopy

et al. 2011

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Specialized microelectrode probes fabricated in a soft polymer film now make it possible to use scanning electrochemical microscopy (SECM) to image the reactivity of large, corrugated, tilted, and dry surfaces. In their article Fernando Cortés-Salazar, Dmitry Momotenko, and Hubert H. Girault discuss the features and applications of the technique. The image shows a fountain pen probe for dry surface imaging and an array of microelectrodes for imaging large surfaces.

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Section: ' Secm Scanning With Multiplexed Probesmentioning

confidence: 99%

Seeing Big with Scanning Electrochemical Microscopy

et al. 2011

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“…The possible destruction and denaturalization of the intrinsic structure beneath the machining surface usually caused by highenergy beam machining can be avoided. In our laboratory the replication of complex 3D microstructures has been achieved on the surface of GaAs, Si, copper and nickel with a nano or sub-micro resolution [28][29][30][31].…”

Section: Introductionmentioning

confidence: 99%

“…In this paper we present an electrochemical bulk micromachining method named the confined etchant layer technique (CELT) [28][29][30][31][32] for micromachining titanium and its alloys. The fundamentals of CELT can be described as follows: The etchant is generated electrochemically on the surface of a machining tool or a mold with desired 3D microstructures.…”

Section: Introductionmentioning

confidence: 99%

A potential method for electrochemical micromachining of titanium alloy Ti6Al4V

Jiang

Attia

et al. 2008

J Appl Electrochem

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The micromachining of complex three-dimensional microstructures (bulk micromachining) on metals can be applied to fabricate many novel devices for micro electromechanical system (MEMS), which will greatly benefit the development of MEMS. In this paper, a new electrochemical micromachining method named the confined etchant layer technique (CELT) was explored on the micromachining of the titanium alloy. Micro-scale trapezoidal slots were replicated on titanium alloy by using a mold with the corresponding negative microstructures (trapezoidal teeth). The machining resolution reached 0.503 mu m. The electrochemical mechanisms involved in the process are analyzed and the parameters that influenced the machining resolution are discussed

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“…Experimental section. The machining can be achieved when the distance between electrode and workpiece is lower than a threshold value (Jiang et al, 2005;Shi et al, 2005;Zhang et al, 2006;Tang et al, 2007;Ma et al, 2007;Zhang et al, 2007). It can achieve etching pattens with high resolution, if the electrode and the workpiece remains relative rest.…”

Section: Experimental and Simulationsmentioning

confidence: 99%

Etching and smooth processing of GaAs surface based on the confined etchant layer technique

Cao

Guo

Yan

et al. 2017

IJNM

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Confined etchant layer technique (CELT) is an effective electrochemical etching method for micro-machining, which can be used to replicate complex three-dimensional microstructures and implement rough surface smooth processing. Through the coupling between electrochemically induced chemical etching processes and mechanical motion, a combination of high machining efficiency, low machining cost and good machining accuracy can be reached. In this paper, a CELT processing platform was established. By combining simulations with experiments, we studied the influence of the solution proportioning on the etching results of GaAs surface and verified the capacity of the CELT technique to achieve smooth processing. It is shown that by taking advantage of CELT, the surface roughness can reach nano-scale.Keywords: confined etchant layer technique; CELT; mechanical motion; smooth processing; simulation.Reference to this paper should be made as follows: Cao, Y., Guo, S., Yan, Y., Hu, Z., Zhao, X. and Li, Z. (2017)

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Microfabrication of a Diffractive Microlens Array on n‐GaAs by an Efficient Electrochemical Method

Cited by 46 publications

References 32 publications

Seeing Big with Scanning Electrochemical Microscopy

Seeing Big with Scanning Electrochemical Microscopy

A potential method for electrochemical micromachining of titanium alloy Ti6Al4V

Etching and smooth processing of GaAs surface based on the confined etchant layer technique

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