2022
DOI: 10.1364/oe.464192
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Microflow multi-layer diffraction optical element processed by hybrid manufacturing technology

Abstract: Traditional planar diffractive optical elements (DOEs) are challenged in imaging systems due to diffraction efficiency and chromatic dispersion. In this paper, we have designed a microfluidic diffractive optical element (MFDOE), which is processed by digital micromirror device (DMD) maskless lithography (DMDML) assisted femtosecond laser direct writing (FsLDW). MFDOE is a combination of photoresist-based multi-layer harmonic diffraction surface and liquid, realizing diffraction efficiency of more than 90% in t… Show more

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Cited by 6 publications
(4 citation statements)
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“…For example, Tan et al combined the advantage of TPP and DMD micro stereolithography (DMDMSL) (TPP-DMDMSL) for hybrid 3D printing (Fig. 2d) 105,106 . The TPP system can produce voxels with a diameter of 400 nm; however, its processing efficiency is low.…”
Section: Hybrid 3d Printing Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…For example, Tan et al combined the advantage of TPP and DMD micro stereolithography (DMDMSL) (TPP-DMDMSL) for hybrid 3D printing (Fig. 2d) 105,106 . The TPP system can produce voxels with a diameter of 400 nm; however, its processing efficiency is low.…”
Section: Hybrid 3d Printing Methodsmentioning
confidence: 99%
“…Based on hybrid 3D printing technology, Tan et al designed and processed a multifunctional double-sided microfluidic system using SU-8 and PDMS material 105 . Fig.…”
Section: Imaging System Combined With Microfluidicsmentioning
confidence: 99%
“…[131] Dawson et al [159] used SU-8 photoresist to fabricate a polymeric waveguide which was integrated with semiconductor nanowire lasers with coupling losses as low as −17 dB(Figure 5a(ii)). To further verify the feasibility of SU-8 photoresist in the preparation of more fine and complex structures, Liu and co-workers [160] from Northeast Normal University prepared microfluidic diffractive optical elements (MFDOEs) by using SU-8 photoresist based on the FsLDW technique (Figure 5a(iii)). This microfluidic diffractive optical element is based on the combination of a multilayer harmonic diffractive surface of photoresist and a liquid, which achieves a diffraction efficiency of more than 90% in the visible band and exhibits achromatic features in both bands at 469 nm (±20 nm) and 625 nm (±20 nm).…”
Section: Su-8 Photoresist and Its Applicationsmentioning
confidence: 99%
“…Three-dimensional (3D) two-photon nanolithography is an important technology for the manufacturing of 3D structures, [34][35][36] which allows fast and flexible fabrication of micro-and nanooptical elements at nearly 100 nm resolution, [37,38] even complex multilayer broadband diffraction optical elements [39,40] and high aspect-ratio holographic elements. [41] In addition, the throughput of two-photon lithography can be significantly improved by adopting the multifocal strategy [42,43] and varying focusing conditions.…”
Section: Introductionmentioning
confidence: 99%