1998
DOI: 10.1109/5.704281
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Micromachined devices for wireless communications

Abstract: Abstract-An overview of recent progress in the research and development of micromachined devices for use in wireless communication sub-systems is presented. Among the specific devices described are tunable micromachined capacitors, integrated high-Q inductors, micromachined low-loss microwave and mm-wave filters, low loss micromechanical switches, microscale vibrating mechanical resonators with Q's in the tens of thousands, and miniature antennas for mm-wave applications. Specific applications are reviewed for… Show more

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Cited by 381 publications
(170 citation statements)
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“…Moreover, integrating individual mechanical elements to realize large-scale systems requires developing methods to couple individual mechanical elements to facilitate new types of coordinated, collective and engineered system response. To date, coupling of only several micromechanical elements has been reported; nonetheless this makes possible micromechanical filters with programmed passband response at radio frequencies [3]. However, the collective response of large arrays of coupled micromechanical devices has not yet been achieved.…”
Section: T He Field Of Microelectromechanical Systems (Mems)mentioning
confidence: 99%
“…Moreover, integrating individual mechanical elements to realize large-scale systems requires developing methods to couple individual mechanical elements to facilitate new types of coordinated, collective and engineered system response. To date, coupling of only several micromechanical elements has been reported; nonetheless this makes possible micromechanical filters with programmed passband response at radio frequencies [3]. However, the collective response of large arrays of coupled micromechanical devices has not yet been achieved.…”
Section: T He Field Of Microelectromechanical Systems (Mems)mentioning
confidence: 99%
“…Most present day nanomechanical devices are based on thin cantilever beams above a silicon substrate fabricated by photolithography followed by dry and wet chemical etching [310,311,[322][323][324]. Such cantilevers are usually suspended about 100 nm above the silicon substrate [323,324].…”
Section: Appendix a Applications Of The Casimir Force In Nanotechnologymentioning
confidence: 99%
“…Such cantilevers are usually suspended about 100 nm above the silicon substrate [323,324]. The cantilevers move in response to the Casimir force, applied voltages on the substrate, or in response to incoming radio-frequency signals [323,324].…”
Section: Appendix a Applications Of The Casimir Force In Nanotechnologymentioning
confidence: 99%
“…Recent demonstrations of micro-scale high-oscillators and mechanical bandpass filters with area dimensions on the order of 30 m 20 m now bring the first of the above strategies closer to reality [9], [10]. Such devices utilize high-on-chip micromechanical (hereafter referred to as " ") resonators [11], [12] constructed in polycrystalline silicon using integrated-circuit (IC) compatible surface micromachining fabrication techniques, and featuring 's of over 80 000 [13] under vacuum and center frequency temperature coefficients in the range of 10 ppm/ C (several times less with nulling techniques) [14].…”
Section: Introductionmentioning
confidence: 99%