Micromachined reactors for catalytic partial oxidation reactions

Srinivasan, R.; Hsing, I‐Ming; Berger, Peter E.; Jensen, Klavs F.; Firebaugh, Samara L.; Schmidt, Martin; Harold, Michael P.; Lerou, Jan; Ryley, J.

doi:10.1002/aic.690431117

Cited by 242 publications

(141 citation statements)

References 18 publications

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“…Clearly, integrated sensing is an enabling technology that can significantly advance the utility and applicability of microchemical systems [19][20][21].…”

Section: Introductionmentioning

confidence: 99%

A micromachined thin-film gas flow sensor for microchemical reactors

Shin¹,

Besser

2006

J. Micromech. Microeng.

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As microchemical systems (MCS) have gained in importance since their introduction in the last decade, it has become recognized that appropriate sensing and control capabilities are needed if MCS are to reach their potential. In this context, we present a study of the working behavior of a novel thin-film micro flow sensor which is integrated with a silicon microreactor with a submillimeter channel. A simple-to-fabricate device based on the concept of calorimetric sensing was chosen as a model structure to understand the important factors controlling sensor performance. Various design options for the sensor were explored by the use of computational fluid dynamics simulations. We found that sensitivity depends strongly on certain design factors. In summary, sensitivity is improved with (a) higher values of the resistors that detect flowinduced temperature changes, (b) shorter distances between the resistor that provides a source of heat and the thermally sensitive resistors and (c) higher input power to the heating resistor. Item (a) was found to have by far the strongest effect of the three. Reproducibility tests were conducted and the sensor exhibited consistent performance throughout the entire test range of 0 to 20 sccm which is an appropriate fit to the flow capacity of the microchannel. Finally, response time was assessed by simulating the transient behavior of the sensor with a thermal capacitance model, which yielded an accurate prediction of the experimental response of the device. The response time is approximately 70 msec at a typical flow rate of 10 sccm.According to the understanding gained by the model, the sensor response time can be improved by reducing the substrate thickness, using a lower density substrate material, and increasing the convective heat transfer coefficient in the channel.3

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“…Clearly, integrated sensing is an enabling technology that can significantly advance the utility and applicability of microchemical systems [19][20][21].…”

Section: Introductionmentioning

confidence: 99%

A micromachined thin-film gas flow sensor for microchemical reactors

Shin¹,

Besser

2006

J. Micromech. Microeng.

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“…Srinivasan et al 78 performed the partial oxidation of ammonia using a silicon-based micro reactor. Integrated heaters as well as¯ow and temperature sensors were fabricated into the sub-mm¯ow channels.…”

Section: Gas Phase Reactionsmentioning

confidence: 99%

Micro reactors: principles and applications in organic synthesis

et al. 2002

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“…ICRO channels are essential components of micro-fluidic systems, in which they act as connections between, e.g., pumps, valves, and sensors [1], as separation columns for several different types of chromatography [2]- [4] or as heat exchangers, e.g., in microreactors [5] or for electronic chip cooling [6]. Initially, most of these structures were fabricated by conventional micromachining in single-crystalline silicon bulk material [7], but recently, with the advent of planar electrophoresis chips, micromachined channels in electrically insulating and optically transparent materials, like glass and quartz, have become of increasing importance [8]- [11].…”

mentioning

confidence: 99%

Micromachining of buried micro channels in silicon

Boer

Tjerkstra

Berenschot³

et al. 2000

J. Microelectromech. Syst.

171

111

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Abstract-A new method for the fabrication of micro structures for fluidic applications, such as channels, cavities, and connector holes in the bulk of silicon wafers, called buried channel technology (BCT), is presented in this paper. The micro structures are constructed by trench etching, coating of the sidewalls of the trench, removal of the coating at the bottom of the trench, and etching into the bulk of the silicon substrate. The structures can be sealed by deposition of a suitable layer that closes the trench. BCT is a process that can be used to fabricate complete micro channels in a single wafer with only one lithographic mask and processing on one side of the wafer, without the need for assembly and bonding. The process leaves a substrate surface with little topography, which easily allows further processing, such as the integration of electronic circuits or solid-state sensors. The essential features of the technology, as well as design rules and feasible process schemes, will be demonstrated on examples from the field of -fluidics. [482]

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Micromachined reactors for catalytic partial oxidation reactions

Cited by 242 publications

References 18 publications

A micromachined thin-film gas flow sensor for microchemical reactors

A micromachined thin-film gas flow sensor for microchemical reactors

Micro reactors: principles and applications in organic synthesis

Micromachining of buried micro channels in silicon

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