“…1 In conventional lithography a pattern is typically created in a resist layer which is subsequently transferred to a magnetic film. The pattern generation can be accomplished with a number of technologies such as electron beam lithography, 2,3 ion beam lithography, [4][5][6][7][8] near field lithography, 9,10 laser interference lithography, [11][12][13][14] x-ray lithography, 15,16 or nanoimprint. 17,18 Unfortunately, most methods may not be suitable for largescale device fabrication because they are multistep, expensive, and involve time-consuming procedures.…”