2002
DOI: 10.1016/s0304-8853(01)00919-2
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Micromagnetic simulations of the domain structure and the magnetization reversal of Co50Ni50/Pt multilayer dots

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Cited by 12 publications
(8 citation statements)
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“…1 In conventional lithography a pattern is typically created in a resist layer which is subsequently transferred to a magnetic film. The pattern generation can be accomplished with a number of technologies such as electron beam lithography, 2,3 ion beam lithography, [4][5][6][7][8] near field lithography, 9,10 laser interference lithography, [11][12][13][14] x-ray lithography, 15,16 or nanoimprint. 17,18 Unfortunately, most methods may not be suitable for largescale device fabrication because they are multistep, expensive, and involve time-consuming procedures.…”
mentioning
confidence: 99%
“…1 In conventional lithography a pattern is typically created in a resist layer which is subsequently transferred to a magnetic film. The pattern generation can be accomplished with a number of technologies such as electron beam lithography, 2,3 ion beam lithography, [4][5][6][7][8] near field lithography, 9,10 laser interference lithography, [11][12][13][14] x-ray lithography, 15,16 or nanoimprint. 17,18 Unfortunately, most methods may not be suitable for largescale device fabrication because they are multistep, expensive, and involve time-consuming procedures.…”
mentioning
confidence: 99%
“…It is very likely that both states are stable in a wide range of diameters, even at room temperature. Next to the total energy, the magnetization as a function of external field was simulated for different dot shapes (cylindrical, pointed cone and truncated cone) [95]. These simulations clearly show that the shape of the dots strongly influences the switching field, with values ranging from to 0.5 down to 0.22 H k .…”
Section: Micromagnetic Calculations Of Magnetization Reversalmentioning
confidence: 97%
“…Due the constraints imposed by the FFT method used for stray field computation, a uniform grid and rectangular computational areas are needed. The simulations are described in [95]. From the experimental data we know that the dots were not perfect cylinders due to etching damage but appear as truncated cones.…”
Section: Micromagnetic Calculations Of Magnetization Reversalmentioning
confidence: 99%
“…Such a study can contribute to understand the behavior of patterned media for high-density recording and also, but also for non-volatile magnetic memories [67]. Later we use the micromagnetic simulation to study the critical size at which the energy of single domain state (SD) equals that of the two-domain state (TD or MD=multi-domain state) [68]. We also started to simulate the switching field distribution of such SD dots.…”
Section: Magnetic Properties Of Patterned Thin Filmsmentioning
confidence: 99%
“…Beside etch damage also imperfect layer growth might influence the switching field. Systematic influences of this kind of factors are discussed in [68]. An example is the slanting of the sidewalls of the dots, resulting from the imperfect resist pattern shape.…”
Section: Magnetic Properties Of Patterned Thin Filmsmentioning
confidence: 99%