1998
DOI: 10.1063/1.122352
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Microphotoluminescence of oval defects in a GaAs layer grown by molecular beam epitaxy

Abstract: Photoluminescence and photoreflectance study of InGaAs/AlAsSb quantum wells grown by molecular-beam epitaxy Mechanism for low-temperature photoluminescence in GaNAs/GaAs structures grown by molecular-beam epitaxy Appl. Phys. Lett. 75, 501 (1999); 10.1063/1.124429Self-organized InAs/GaAs quantum dots grown by gas source molecular beam epitaxy

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Cited by 11 publications
(12 citation statements)
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“…The dimensions of oval defects are of order several µm [21,22], thus very similar to the size of the islands determined from the µ-PL mapping experiment. The density of such defects may be as low as 10 5 cm −2 , which explains the possibility of observing sharp emission lines even in macro-luminescence experiments.…”
Section: Nature Of the Objects Responsible For Sharp Emission Linessupporting
confidence: 52%
See 1 more Smart Citation
“…The dimensions of oval defects are of order several µm [21,22], thus very similar to the size of the islands determined from the µ-PL mapping experiment. The density of such defects may be as low as 10 5 cm −2 , which explains the possibility of observing sharp emission lines even in macro-luminescence experiments.…”
Section: Nature Of the Objects Responsible For Sharp Emission Linessupporting
confidence: 52%
“…For gallium composition below 0.3 we expect that the islands will no longer behave like indirect objects but will serve as centers of direct recombination which capture diffusing excitons. One can expect that the formation of such islands can be favored in the vicinity of extended defects such as dislocation loops, intrinsic point [18] and/or oval defects with enhanced concentration of gallium [21,22].…”
Section: Nature Of the Objects Responsible For Sharp Emission Linesmentioning
confidence: 99%
“…Surprisingly, this quenching seems unrelated to the surface oval defects, visible in Fig. 1(g)-(h), which only occur on the left and right stacking faults [20]. Thus surface oval defects do not significantly affect the strength of non-radiative recombination occurring at the intersection of a stacking fault and the sample surface.…”
Section: B Photoluminescence Imagingmentioning
confidence: 84%
“…The stacking faults are embedded in the GaAs epitaxial layer which is grown on a (100)-terminated GaAs substrate. The location of the faults are identified by oval defects at the surface [12]. The geometry of the cross-section with respect to the structure is shown in the insets of Fig.…”
Section: Structural Imaging Of Single and Double Stacking Faultsmentioning
confidence: 99%