“…Hence, the substrate temperatures to obtain high-quality materials, including crystalline systems and low dimensional nanostructures, remain within a mild range (Barranco et al, 2016;Joseph et al, 2018;Brandenburg et al, 2019;Chiang et al, 2019;Ostrikov, 2019;Tian et al, 2019;Weltmann et al, 2019). This makes the plasma-assisted methods very attractive for the development of porous layers on temperature sensitive substrates and in applications intended for an efficient payback period, which is the case in microelectronics, photovoltaic, optic, and automotive industries, among others (Joseph et al, 2018;Brandenburg et al, 2019;Chiang et al, 2019;Ostrikov, 2019;Tian et al, 2019;Weltmann et al, 2019). In this article, we will summarize our latest results regarding the development of a hybrid thermal evaporation, plasma deposition and etching approach for the formation of metal and metal oxide porous layers using phthalocyanine and porphyrin molecules as solid metal precursors (see Scheme 1A) for the chemical structure of some of the molecules tested in this article).…”