2011
DOI: 10.1103/physrevb.83.075302
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Microscopic mechanisms behind the high mobility in rubrene single-crystal transistors as revealed by field-induced electron spin resonance

Abstract: The microscopic mechanisms behind the very high mobility in rubrene single-crystal transistors achieved by interface treatments with self-assembled monolayers (SAMs) have been clarified by using field-induced electron spin resonance (FI-ESR). Clearly observed FI-ESR signals exhibit extremely narrow linewidths owing to the very high carrier mobility. The precise angular dependence of FI-ESR g values shows that crystallinity in the semiconductor channel is unchanged by the SAM treatments. The trapping time of ch… Show more

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Cited by 66 publications
(64 citation statements)
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“…This may indicate that the gate voltage dependence of the mobility is negligible in the rubrene device, although the carrier concentration ratio is even smaller than the expected value in the case of β = 2. This result is supported by the transfer characteristics showing a linear I ds 1/2 -V gs dependence, 36 as well as the narrow and V gs -independent FI-ESR line width in the rubrene devices. 38 These facts may indicate that the rubrene single-crystal transistor, fabricated by the lamination technique, produces few deep trap states, resulting in the high charge carrier mobilities.…”
Section: A Fi-esr Measurements On Metal-insulator-semiconductor Confsupporting
confidence: 72%
See 1 more Smart Citation
“…This may indicate that the gate voltage dependence of the mobility is negligible in the rubrene device, although the carrier concentration ratio is even smaller than the expected value in the case of β = 2. This result is supported by the transfer characteristics showing a linear I ds 1/2 -V gs dependence, 36 as well as the narrow and V gs -independent FI-ESR line width in the rubrene devices. 38 These facts may indicate that the rubrene single-crystal transistor, fabricated by the lamination technique, produces few deep trap states, resulting in the high charge carrier mobilities.…”
Section: A Fi-esr Measurements On Metal-insulator-semiconductor Confsupporting
confidence: 72%
“…26 So far, this method has been applied to various OFETs of poly(3-alkylthiophene), [26][27][28][29][30] pentacene, [31][32][33] thienothiophene-based high-mobility materials, 34,35 and rubrene single crystals, 36 etc., giving microscopic information such as spin-charge relation, carrier wave function, motional effect of charge carriers, and local molecular orientation at the device interface. In particular, direct determination of spin concentration within the channel during device operation played a crucial role in clarifying the operation mechanism of OFETs, as was demonstrated for P3HT transistors using top-contact geometry, 37 and subsequently, for rubrene single-crystal transistors with bottom-contact geometry; 38 the spin concentration exhibited a clear decrease by applying V ds together with V gs in the linear region, whereas no V ds dependence was observed for the saturation region.…”
Section: Introductionmentioning
confidence: 99%
“…[39,40,41] It is not clear however if the obtained lengths should be associated to the presence of intrinsic thermal disorder or to trapping by extrinsic sources of disorder. In any case, these findings provide strong indications that a true quantum localization process takes place in organic semiconductors.…”
Section: Experimental Overviewmentioning
confidence: 99%
“…In the case of motional narrowing, ¦H pp with broad Lorentzian line width is approximately proportional to trapping time of charge carriers¸t r , which is considered to be governed by thermal activation. 12 The inset of Figure 4 shows the Arrhenius plot of ¦H pp , and data above 200 K follows the activation formula [exp(¦/kT)] with the activation energy ¦ of 0.011 eV (the solid line in the inset).…”
Section: ¹3mentioning
confidence: 99%