Chemically grafted monolayers of trialkylsilanes were prepared by reaction of (primarily) alkyldimethylchlorosilanes with silicon wafers under three conditions: in the vapor phase at elevated temperature
(60−70 °C), in toluene in the presence of ethyldiisopropylamine (EDIPA) at room temperature, in toluene/EDIPA at 60−70 °C. It was determined that reactions at the solution−solid interface are very slow in the
later stages of the reaction and that long reaction times are necessary to achieve maximum bonding
density. The bonding density is determined and can be controlled by the reaction conditions. The highest
carbon content on the surface (assessed by X-ray photoelectron spectroscopy) as well as the highest contact
angles were obtained using vapor phase reactions. A series of nine H(CH2)
n
Me2Si− surfaces was prepared
with n = 1, 2, 3, 4, 8, 10, 12, 18, and 22. Water contact angles (θA/θR = ∼105°/∼94°) are independent of
chain length, indicating that these surfaces project disordered methyl groups toward the probe fluid and
that water does not penetrate the monolayers. Hydrophobization is achieved topologically: the monolayers
prevent water from penetrating and interacting with residual silanols. n-Hexadecane and methylene
iodide contact angles decrease with increasing chain length for this series, indicating that these probe
fluids penetrate the monolayers and interact with methylene groups. These chemically grafted monolayers
differ in structure from those prepared by self-assembly in that the distance between molecules is significantly
greater and that all molecules are covalently attached to the substrate. The contact angle hysteresis for
these surfaces is a function of alkyl group structure and bonding density: mobile surfaces with flexible
chains or rotational mobility and rigid surfaces that pack well exhibit low hysteresis, whereas rigid surfaces
that cannot pack well exhibit high hysteresis. We argue that molecular level topography (roughness and
rigidity) is responsible for the observed hysteresis.