Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium

Fernández, A.; Sauvage, Thierry; Diallo, Babacar; Hufschmidt, Dirk; Haro, M.C. Jiménez de; Montes, O.; Martínez-Blanes, J.M.; Caballero, J.; Godinho, Vanda; Fernandez, J.; Ibrahim, Soad; Brault, Pascal; Thoman, A.-L.-

doi:10.1016/j.matchemphys.2023.127674

Cited by 4 publications

(7 citation statements)

References 33 publications

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“…Table 2 also shows that for pure Ne plasma, the dc mode produces larger pore sizes than the rf one. This result is in agreement with previous data for He-charged Si films in reference [ 25 ]. In addition, larger bubbles may be associated with lower gas densities, also according to previous results with He [ 24 , 26 ].…”

Section: Resultssupporting

confidence: 94%

“…In this work, an important advantage of this technique is the availability to quantify light elements such as He and possible H, C and O contaminants. Impurities typically come from residual vacuum species activated during MS deposition [ 25 ]. Representative impurities are reported in Table 4 for samples S1 and S2.…”

Section: Resultsmentioning

confidence: 99%

“…For pure Ne plasma, the dc mode produces larger pore sizes and lower amounts of trapped Ne compared to the rf mode. The silicon films in this work have proved to be amorphous, as in the case of pure He [ 25 ]. In spite of the strong nanostructuration of the films (nanovoids/nanobubbles), the materials have shown to be stable for years under gentle manipulation.…”

Section: Discussionmentioning

confidence: 99%

“…These include, among others, optical devices [ 19 ], electrodes in batteries [ 20 , 21 ] or catalysts [ 23 ]. An exhaustive microstructural characterization also showed that gas content and nanobubble size and shape are finely tunable [ 17 , 24 , 25 ]. Due to the high density and pressure of He trapped in the nanobubbles [ 24 , 25 , 26 , 27 ], the He-charged Si films have been proposed as “solid targets” for nuclear reaction studies in our previous works [ 28 , 29 , 30 , 31 , 32 , 33 ].…”

Section: Introductionmentioning

confidence: 99%

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Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Fernández,

Godinho,

Ávila

et al. 2024

Nanomaterials

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Sputtering of silicon in a He magnetron discharge (MS) has been reported as a bottom-up procedure to obtain He-charged silicon films (i.e., He nanobubbles encapsulated in a silicon matrix). The incorporation of heavier noble gases is demonstrated in this work with a synergistic effect, producing increased Ne and Ar incorporations when using He–Ne and He–Ar gas mixtures in the MS process. Microstructural and chemical characterizations are reported using ion beam analysis (IBA) and scanning and transmission electron microscopies (SEM and TEM). In addition to gas incorporation, He promotes the formation of larger nanobubbles. In the case of Ne, high-resolution X-ray photoelectron and absorption spectroscopies (XPS and XAS) are reported, with remarkable dependence of the Ne 1s photoemission and the Ne K-edge absorption on the nanobubble’s size and composition. The gas (He, Ne and Ar)-charged thin films are proposed as “solid” targets for the characterization of spectroscopic properties of noble gases in a confined state without the need for cryogenics or high-pressure anvils devices. Also, their use as targets for nuclear reaction studies is foreseen.

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Section: Resultssupporting

confidence: 94%

Section: Resultsmentioning

confidence: 99%

Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Fernández,

Godinho,

Ávila

et al. 2024

Nanomaterials

Self Cite

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show abstract

“…These include, among others, optical devices [19], electrodes in batteries [20,21] or catalysts [23]. An exhaustive microstructural characterization also showed that gas content and nanobubbles size and shape are finely tunable [17,24,25]. Due to the high density and pressure of He trapped in the nanobubbles [24][25][26][27], the He-charged Si films have been proposed as "solid-targets" for nuclear reaction studies in our previous works [28][29][30][31][32][33].…”

Section: Introductionmentioning

confidence: 99%

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Fernández,

Godinho,

Avila

et al. 2024

Preprint

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: Sputtering of silicon in a Helium magnetron discharge (MS) has been reported as a bottom-up procedure to obtain He-charged silicon films (i.e. He nanobubbles encapsulated in a silicon matrix). The incorporation of heavier noble gases is demonstrated in this work with a synergistic effect producing increased Ne and Ar incorporations when using He-Ne and He-Ar gas mixtures in the MS process. Microstructural and chemical characterizations are reported by ion beam analysis (IBA) and scanning and transmission electron microscopies (SEM and TEM). In addition to gas incorporation, helium promotes the formation of larger nanobubbles. For the case of Ne high resolution X-ray photoelectron and absorption spectroscopies (XPS and XAS) are reported with remarkable dependence of the Ne 1s photoemission and the Ne K-edge absorption on the nanobubbles size and composition. The gas (He, Ne, Ar) charged thin films are proposed as “solid” targets for the characterization of spectroscopic properties of noble gases in a confined state without the need for cryogenics or high-pressure anvils devices. Also their use as targets for nuclear reaction studies is foreseen.

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Microstructural evolution and properties of He-charged a-Si coatings prepared by magnetron sputtering

Godinho,

Caballero-Hernández,

Lacroix

et al. 2024

Applied Surface Science

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Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium

Cited by 4 publications

References 33 publications

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies

Microstructural evolution and properties of He-charged a-Si coatings prepared by magnetron sputtering

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