2011
DOI: 10.1016/j.actamat.2011.01.032
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Microstructure and elastic properties of atomic layer deposited TiO2 anatase thin films

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Cited by 32 publications
(13 citation statements)
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References 37 publications
(53 reference statements)
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“…The surface micrograph of different deformation areas remain, whereas at higher T d (450°C and 500°C) the deformation is homogenous over the surface. At low T d , the diversity in mechanical responses is probably linked to small variations in the Young's modulus as a function of crystallographic orientation [45]. At high T d , we link the decrease in the diversity of deformation areas to the general decrease in the grain size, which means that what is probed at higher T d is the mechanical response of a group of nanostructured tree-like columns with different crystallographic planes.…”
Section: Morphologymentioning
confidence: 79%
“…The surface micrograph of different deformation areas remain, whereas at higher T d (450°C and 500°C) the deformation is homogenous over the surface. At low T d , the diversity in mechanical responses is probably linked to small variations in the Young's modulus as a function of crystallographic orientation [45]. At high T d , we link the decrease in the diversity of deformation areas to the general decrease in the grain size, which means that what is probed at higher T d is the mechanical response of a group of nanostructured tree-like columns with different crystallographic planes.…”
Section: Morphologymentioning
confidence: 79%
“…3. Young's modulus and hardness of the films increase with the decreasing O 2 gas flow rate, confirming the formation of denser microstructures and lower levels of porosity in the films [18,19]. Plasma assisted samples have enhanced Young's modulus and hardness readings compared to those without plasma treatment, indicating formation of denser microstructures [18,19].…”
Section: Resultsmentioning
confidence: 56%
“…Young's modulus and hardness of the films increase with the decreasing O 2 gas flow rate, confirming the formation of denser microstructures and lower levels of porosity in the films [18,19]. Plasma assisted samples have enhanced Young's modulus and hardness readings compared to those without plasma treatment, indicating formation of denser microstructures [18,19]. For the photocatalytic analysis, the Langmuir-Hinshelwood pseudo-first-order kinetics model is generally used for low dye concentrations [20]: where C 0 is the original MB concentration, C is the concentration at time t,k is the pseudo-first-order rate constant, C a is the concentration after adsorption.…”
Section: Resultsmentioning
confidence: 65%
“…A major advantage of laboratory prepared samples by ALD is that the thin film thickness (directly proportional to the mass by material density and surface area) is directly related to the number of cycles, a process parameter that can be determined in advance. Because of the experience of Chem4Tech research group depositing titania at low temperature by means of ALD [23], it was chosen as the reference material.…”
Section: Methodsmentioning
confidence: 99%