2005
DOI: 10.1016/j.jmmm.2004.11.383
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Microstructure and magnetic properties of SmCo films

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Cited by 28 publications
(20 citation statements)
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“…As presented in our previous work [5] and as published elsewhere in the literature [6] sputtering a binary alloy target like SmCo using a wide range of deposition pressures p Ar , results in the following: low pressures promote films richer in lighter atoms -in our case Co-, while higher p Ar , result in an enrichment of the film with heavier atoms -Sm in our case. As was confirmed through the XRD studies, the deposition of SmCo films at room temperature resulted in amorphous samples, while the hard magnetic properties developed only by postdeposition annealing under vacuum at temperatures ranging from 550 o C up to 650 o C. Figure 1 shows the XRD results for SmCo films with Ta buffer and cap layers sputtered at different deposition pressures that were annealed in vacuum at 600 °C for 30 min.…”
Section: Resultssupporting
confidence: 76%
“…As presented in our previous work [5] and as published elsewhere in the literature [6] sputtering a binary alloy target like SmCo using a wide range of deposition pressures p Ar , results in the following: low pressures promote films richer in lighter atoms -in our case Co-, while higher p Ar , result in an enrichment of the film with heavier atoms -Sm in our case. As was confirmed through the XRD studies, the deposition of SmCo films at room temperature resulted in amorphous samples, while the hard magnetic properties developed only by postdeposition annealing under vacuum at temperatures ranging from 550 o C up to 650 o C. Figure 1 shows the XRD results for SmCo films with Ta buffer and cap layers sputtered at different deposition pressures that were annealed in vacuum at 600 °C for 30 min.…”
Section: Resultssupporting
confidence: 76%
“…SmCo 5 thin films with high coercivity and high-magnetic anisotropy have been widely studied in the last three decades. It has been found that appropriate single crystal substrates such as MgO (1 0 0), MgO (11 0) [4][5][6][7][8] and Si (1 0 0) [9][10][11][12] can lead to epitaxial or highly textured growth of SmCo 5 films with high coercivity values. On the other hand, for practical reason, many researchers have dedicated themselves to develop techniques for high coercivity SmCo 5 films grown on amorphous or polycrystalline substrates such as glass, Al and Al 2 O 3 [13][14][15][16][17][18][19][20][21][22][23][24][25][26].…”
Section: Introductionmentioning
confidence: 99%
“…Due to the thickness and high crystallinity, also the K b peak of the MgO substrate is visible. In Figure 1(b), the region around the SmCo (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) peak is shown, for films grown with a sputter pressure of 1.5, 3.0, 7.5, and 10.5 Â 10 À3 mbar. Clearly visible is that, with decreasing pressure, the peaks shift to a higher angle.…”
Section: A Composition and Morphologymentioning
confidence: 99%
“…However, for various applications, growing Sm-Co thin films from alloy targets is a desirable option since only one deposition source is needed. Still, as far as we know, relatively few groups [12][13][14][15][16][17][18][19][20] have reported on the growth of Sm-Co thin films from single alloy targets. The purpose of this work is to show what the properties are of such films, grown on MgO(100), and in a range of pressures.…”
Section: Introductionmentioning
confidence: 99%