2020
DOI: 10.3390/ma13163576
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Microstructure and Mechanical Properties of Annealed WC/C PECVD Coatings Deposited Using Hexacarbonyl of W with Different Gases

Abstract: The present work studies the tungsten carbide (WC/C) coatings deposited by using Plasma Enhanced Chemical Vapor Deposition (PECVD), with and without gases of Ar and N2. Volatile hexacarbonyl of W was used as a precursor. Their mechanical and tribological properties were evaluated. The following values were obtained by using deposition process with N2 of HIT = 19.7 ± 4.1 GPa, EIT = 221 ± 2.1 GPa, and coefficient of friction (COF) = 0.35 ± 0.09. Secondly, deposition without the aforementioned gas obtained values… Show more

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Cited by 5 publications
(18 citation statements)
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References 25 publications
(72 reference statements)
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“…As a measure of accordance of simulated and real (measured) values, a coefficient of determination (R 2 ) is established giving information how fit a model is [25]. Some interesting researches regarding mechanical properties of different materials can be found in literature, such as those presented in References [26,27].…”
Section: Mechanical Behavior Of Materials At Different Temperaturesmentioning
confidence: 99%
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“…As a measure of accordance of simulated and real (measured) values, a coefficient of determination (R 2 ) is established giving information how fit a model is [25]. Some interesting researches regarding mechanical properties of different materials can be found in literature, such as those presented in References [26,27].…”
Section: Mechanical Behavior Of Materials At Different Temperaturesmentioning
confidence: 99%
“…Some interesting researches regarding mechanical properties of different materials can be found in literature, such as those presented in References. [26,27].…”
Section: Mechanical Behavior Of Materials At Different Temperaturesmentioning
confidence: 99%
“…This process can be used in an improved CVD method, which is also called the plasma-enhanced (plasma-activated (PA), or plasma-inducted (PI)) chemical vapor deposition (PE CVD, PA CVD, or PI CVD) method. During plasmochemical processes (e.g., based on Ar and N2) the gas mixture is ionized and kinetic energy is transmitted to the used precursors, for example, wolfram carbonyl [21][22][23][24][25][26][27][28][29][30][31], chromium carbonyl [23,26,28,30,[32][33][34][35], and molybdenum carbonyl [21,29,30,31,36], which sublime in the reactor at low temperatures.…”
Section: Introductionmentioning
confidence: 99%
“…The properties of WC/C coatings deposited by using PE CVD methods have been widely studied [22][23][24][25]27], as well as the properties of the Cr/C [33][34][35] and MoC/C [29] layers. To obtain a higher value of surface hardness and lower COF of WC/C thin coatings, C2H2 [23] and N2 [8,17,27] gases have been used during the deposition process.…”
Section: Introductionmentioning
confidence: 99%
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