“…This process can be used in an improved CVD method, which is also called the plasma-enhanced (plasma-activated (PA), or plasma-inducted (PI)) chemical vapor deposition (PE CVD, PA CVD, or PI CVD) method. During plasmochemical processes (e.g., based on Ar and N2) the gas mixture is ionized and kinetic energy is transmitted to the used precursors, for example, wolfram carbonyl [21][22][23][24][25][26][27][28][29][30][31], chromium carbonyl [23,26,28,30,[32][33][34][35], and molybdenum carbonyl [21,29,30,31,36], which sublime in the reactor at low temperatures.…”