Microstructure and mechanical properties of metal/ceramic Ti/TiN multilayers

Wen, Liping; Huang, Renkun; Liang, Guo; Gong, Jun; Wei, Tianyun; Chuang, Yu-Liang

doi:10.1016/0304-8853(93)90580-u

Cited by 15 publications

(3 citation statements)

References 7 publications

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“…The alternation of energy bands and the limitation by so much grain boundaries of aluminum nano-film cause an abrupt decrease in the carrier density. Generally, the grain size of thin films decreases with decreasing thickness of the film [14], resulting in decreased limitation by boundaries and in increased carrier density obtained with Hall effect method [1,15]. The alternation of microstructure during depositing aluminum films is one of the reasons for variation of carrier density.…”

Section: Resultsmentioning

confidence: 99%

“…If we take aluminum films with thickness of 40 nm as an example, the plasma frequency calculated with its carrier density by formula (6), is 13.49´10 14 Hz. On the other side, the value of electromagnetic field angle frequency of the maximum on absorptance spectra of the film is 13.56´10 14 Hz. Agreement of these two values suggests us the plasma oscillation nature of the absorption peak.…”

Section: Resultsmentioning

confidence: 99%

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Plasma Model in Aluminum Nano-Films

Lee

Sun

et al. 2003

MSF

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The mode of electromagnetic response of aluminum nano-films has been suggested by meaning of electromagnetic wave reflectance, transmittance and carrier density of the films. The carrier density of the films and dependence of their plasma frequency on the film thickness have been obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field has been set up by using the measured reflectance and transmittance, which provides relationship between plasma frequency and film thickness. Both plasma frequency and film thickness proved plasma resonance.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Plasma Model in Aluminum Nano-Films

Lee

Sun

et al. 2003

MSF

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“…When the deposition time is 120 minutes, the wear rate is the smallest (1.8×10-4g/s), indicating that this coating has the best wear resistance Wear is an inevitable result of friction, which is the process of continuous loss of the contact surface between two relatively moving objects when they come into contact. The wear resistance of the coating is closely related to its structural composition, density, hardness, and film based bonding strength (Wen et al, 1993). For the same material, the denser the structure, the higher the hardness, and the stronger the adhesion between the film and substrate, the stronger the ability of the coating to resist wear, that is, the better the wear resistance.…”

Section: Friction and Wear Properties Of Cr Platingmentioning

confidence: 99%

Structural Evolution and Properties of Cr Coatings on Rings Deposited by High Power Pulsed Magnetron Sputtering

Yang,

Hao,

Wang

et al. 2023

Smart Manufacturing and Material Processing (SMMP)

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The ring is a key component of the high-speed ring spinning machine, which is in sliding friction environment for a long time. A chromium coating with high hardness is usually prepared on rings surface by electroplating technology to improve the mechanical properties and the working life of rings in the current industrial field. However, the environ-mental pollution associated with electroplating technology has restricted its industrial production, and it is urgent to find a non-polluted coating preparation technology. In this paper, an environmentally friendly high power pulsed magnetron sputtering technology was used to prepare the pure Cr coatings with different thickness on the ring surface. The mi-crostructure, deposition rate, adhesion between film and substrate and tribological property of coatings were character-ized by different means. The results showed that with the prolongation of deposition time, the degree of crystallization of coatings was gradually enhanced, and the surface microstructure was gradually transformed from small and dispersed irregular polygonal structure to circular arc irregular cellular structure. When the deposition time were 120 mins, the film thickness was about 6.4 μm, and the average and instantaneous deposition rates of Cr coating were 53 nm/min and 267 nm/min, respectively The coating had the best film-substrate adhesion, low friction coefficient of 0.41 and the best wear resistance (mass wear rate of 1.8×10-4 g/s).

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Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating

Lin

Zhao

Dong

et al. 2007

Plasma Process. Polym.

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Ti/TiN multilayer films were deposited on high‐speed‐steel (HSS) substrates using pulsed‐bias arc ion plating. Orthogonal experiments were used to analyze factors affecting microhardness of the films. The results show that of all the pulsed bias related parameters including pulsed bias magnitude, duty ratio, frequency, and film geometry parameters including modulation period, TiN/Ti thickness ratio, and grain size of TiN, the pulsed bias magnitude is the major factor affecting the microhardness. The maximum microhardness of 34.1 GPa was obtained with pulsed bias magnitude 900 V, duty ratio 50%, frequency 30 kHz, and modulation period 84 nm.

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Microstructure and mechanical properties of metal/ceramic Ti/TiN multilayers

Cited by 15 publications

References 7 publications

Plasma Model in Aluminum Nano-Films

Plasma Model in Aluminum Nano-Films

Structural Evolution and Properties of Cr Coatings on Rings Deposited by High Power Pulsed Magnetron Sputtering

Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating

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