2006
DOI: 10.1051/epjap:2006151
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Microstructure and morphology evolution in chemically deposited semiconductor films: 4. From isolated nanoparticles to monocrystalline PbS thin films on GaAs(100) substrates

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Cited by 33 publications
(75 citation statements)
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“…In order to eliminate this factor, freshly prepared solutions were used. The CBD set-up and substrate preparation are described elsewhere [2][3][4][5][6][7]. The morphology of the films was studied by X-ray diffraction (XRD), ultrahigh resolution scanning electron microscopy (UHR-SEM), transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM).…”
Section: Methodsmentioning
confidence: 99%
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“…In order to eliminate this factor, freshly prepared solutions were used. The CBD set-up and substrate preparation are described elsewhere [2][3][4][5][6][7]. The morphology of the films was studied by X-ray diffraction (XRD), ultrahigh resolution scanning electron microscopy (UHR-SEM), transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM).…”
Section: Methodsmentioning
confidence: 99%
“…Previous studies showed that the microstructure and morphology evolution of thin lead chalcogenide films on GaAs can be controlled by factors such as deposition time, deposition temperature and intermediate lead chalcogenide layers [2][3][4][5][6][7]. Furthermore, it was shown that the evolution of the film morphology is strongly affected by the active deposition mechanism during the course of deposition.…”
Section: Introductionmentioning
confidence: 99%
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“…This decrease may change the deposition mechanism from cluster to ion-by -ion [29]. Since the surface characteristics of thin films significantly affect film properties, it is important to anticipate which mechanism will form the surface of the film at different temperatures.…”
Section: Methodsmentioning
confidence: 99%