Microstructure and optoelectronic properties of titanium-doped ZnO thin films prepared by magnetron sputtering

Zhong, Zhang; Zhang, T.

doi:10.1016/j.matlet.2013.01.025

Cited by 54 publications

(25 citation statements)

References 16 publications

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“…As the concentration of Ti in the sample increases (4.1 at.%), seen in Figure 5c, the grain size decreases and, most notably, in the case of films with 18.2 at.% of Ti (Figure 5d), where the grain boundaries are barely appreciated. The surface morphology in these high Ti coatings is close to that of those observed in as-deposited TiO 2 films (Figure 5e) that are fully amorphous [22,23], which is in agreement to the findings of Mullerova et al [18]. distribution of grains is more homogeneous all over the surface.…”

Section: Xps Analysissupporting

confidence: 90%

Effect of the Incorporation of Titanium on the Optical Properties of ZnO Thin Films: From Doping to Mixed Oxide Formation

et al. 2019

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ZnO films with Ti atoms incorporated (TZO) in a wide range (0–18 at.%) have been grown by reactive co-sputtering on silicon and glass substrates. The influence of the titanium incorporation in the ZnO matrix on the structural and optical characteristics of the samples has been determined by Rutherford backscattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The results indicate that the samples with low Ti content (<4 at.%) exhibit a wurtzite-like structure, with the Ti4+ ions substitutionally incorporated into the ZnO structure, forming Ti-doped ZnO films. In particular, a very low concentration of Ti (<0.9 at.%) leads to a significant increase of the crystallinity of the TZO samples. Higher Ti contents give rise to a progressive amorphization of the wurtzite-like structure, so samples with high Ti content (≥18 at.%) display an amorphous structure, indicating in the XPS analysis, a predominance of Ti–O–Zn mixed oxides. The energy gap obtained from absorption spectrophotometry increases from 3.2 eV for pure ZnO films to 3.6 eV for those with the highest Ti content. Ti incorporation in the ZnO samples <0.9 at.% raises both the blue (380 nm) and green (approx. 550 nm) bands of the photoluminescence (PL) emission, thereby indicating a significant improvement of the PL efficiency of the samples.

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Section: Xps Analysissupporting

confidence: 90%

Effect of the Incorporation of Titanium on the Optical Properties of ZnO Thin Films: From Doping to Mixed Oxide Formation

et al. 2019

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“…The band gap value of undoped sample increases from 3.264 to 3.282 eV with 1 at.% Ti content, then it decreases with further Ti doping to the values of 3.240, 3.221, 3.185 and 3.149 eV for TZO-2, TZO-3, TZO-4 and TZO-5, respectively. The increasing band gap with Ti doping was also found in some studies [8,23].…”

Section: Optical Propertiessupporting

confidence: 69%

Titanium doping effect on the characteristic properties of sol-gel deposited ZnO thin films

Yılmaz¹,

TURGU²

2016

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Undoped and Ti doped ZnO thin films were made by sol-gel spin coating, and the investigation of structural, morphological and optical features was applied as a function of the doping ratio. The films had a polycrystalline ZnO wurtzite crystal structure with (002) preferential direction and film crystallinity decreased with Ti doping content. The SEM studies indicated that the nanoparticle structure of undoped films changed to nano-network like structure with Ti doping. The transmittance and optical band gap of undoped sample firstly increased with 1 at.% Ti doping and then they decreased with higher Ti level. Consequently, the present work suggests that the characteristic properties of ZnO can be tailored with Ti doping and ZnO:Ti films have a potential importance for usage in many technological applications.

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“…The surface morphology in these high Ti coatings is close to that of observed in as-deposited TiO2 films (Fig. 5e) that are fully amorphous [24,25], in agreement to the findings of Mullerova et al [20]. Summarizing these observations, along with the structure and composition data obtained by RBS, XRD, XPS and SEM, including previous XANES results [12], one can classify the sputtered TZO coatings in three compositional groups, with different properties: a) Films with low Ti content (<0.9 at.…”

Section: Xps Analysissupporting

confidence: 69%

Effect of the Incorporation of Titanium on the Optical Properties of ZnO Thin Films: From Doping to Mixed Oxide Formation

Yuste¹,

Galindo²,

Benito³

et al. 2018

Preprint

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ZnO films with Ti atoms incorporated (TZO) in a wide range (0-18 at. %) have been grown by reactive co-sputtering on silicon and glass substrates. The influence of the titanium incorporation in the ZnO matrix on the structural and optical characteristics of the samples has been determined by Rutherford backscattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The results indicate that the samples with low Ti content (< 4 at. %) exhibit the wurtzite-like structure, with the Ti+4 ions substitutionally incorporated into the ZnO structure, forming Ti-doped ZnO films. In particular, very low concentration of Ti (<0.9 at. %) leads to a significant increase of the crystallinity of the TZO samples. Higher Ti contents give rise to a progressive amorphization of the wurtzite-like structure so samples with high Ti content (≥18at. %), displays an amorphous structure indicating the XPS analysis a predominance of Ti-O-Zn mixed oxides. The energy gap, obtained from absorption spectrophotometry, increases from 3.2 eV for pure ZnO films to 3.6 eV for those with the highest Ti content. Ti incorporation in the ZnO samples below 0.9 at. % rises both, the blue (380 nm) and green (550 nm) bands of the photoluminescence (PL) emission, thereby indicating a significant improvement of PL efficiency of the samples.

show abstract

Microstructure and optoelectronic properties of titanium-doped ZnO thin films prepared by magnetron sputtering

Cited by 54 publications

References 16 publications

Effect of the Incorporation of Titanium on the Optical Properties of ZnO Thin Films: From Doping to Mixed Oxide Formation

Effect of the Incorporation of Titanium on the Optical Properties of ZnO Thin Films: From Doping to Mixed Oxide Formation

Titanium doping effect on the characteristic properties of sol-gel deposited ZnO thin films

Effect of the Incorporation of Titanium on the Optical Properties of ZnO Thin Films: From Doping to Mixed Oxide Formation

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