Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers

Ma, D.L.; Deng, Qiuju; Liu, H.Y.; Li, Y.T.; Leng, Y.X.

doi:10.1016/j.surfcoat.2021.127749

Cited by 10 publications

(13 citation statements)

References 43 publications

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“…Hence, it can be inferred that the decrease in the coefficient of friction in the R1-750 film is a consequence of these factors. 12…”

Section: Resultsmentioning

confidence: 99%

“…Hence, it can be inferred that the decrease in the coefficient of friction in the R1-750 film is a consequence of these factors. 12 Wear behaviour is generally considered a system property of the material and the environment rather than typical material properties such as melting point, electrical conductivity, modulus of elasticity, etc. 33 The wear rates and friction coefficients obtained from the wear tests of R1 films in dry environments were given in Figure 8.…”

Section: Tribological Propertiesmentioning

confidence: 99%

“…11 In recent years, when the literature studies were examined, the structural, mechanical, and tribological properties of Ti 2 AlN films produced by the magnetron sputtering technique were investigated. Ma et al 12 used high-power pulsed magnetron sputtering (HPPMS) to deposit Ti/AlN multilayers of varying thicknesses. Then, crystalline Ti 2 AlN thin films were produced by vacuum annealing.…”

Section: Introductionmentioning

confidence: 99%

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The effect of different annealing temperatures on the mechanical and tribological properties of the Ti₂AlN MAX phase films

Cakir,

Cicek,

Duran

et al. 2024

Surface Engineering

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Ti2AlN MAX phase films produced at different N2 flow rates and different annealing temperatures were deposited on 52100 steel substrates using the closed-field unbalanced magnetron sputtering technique. N2 flow rates were changed to 2, 3.5, and 5 sccm. Due to the increasing N2 flow rate, film thickness decreased from 2 to 1.3 µm. Then the produced films were subjected to annealing at temperatures of 700, 750, and 800°C. After the film produced at a flow rate of 2 sccm was annealed at 750°C, the presence of the Ti2AlN MAX phase was determined. The binding energies of Ti 2p, Al 2p, and N 1s determined in the XPS analysis confirmed the existence of the Ti2AlN film. The friction coefficient measured for Ti2AlN MAX phase films was calculated as 0.53, the hardness value as 22.8 GPa, the elastic modulus as 291.4 GPa, and the wear rate as 2.96 × 10−4 mm3/(N·m).

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“…Hence, it can be inferred that the decrease in the coefficient of friction in the R1-750 film is a consequence of these factors. 12…”

Section: Resultsmentioning

confidence: 99%

Section: Tribological Propertiesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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The effect of different annealing temperatures on the mechanical and tribological properties of the Ti₂AlN MAX phase films

Cakir,

Cicek,

Duran

et al. 2024

Surface Engineering

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“…Ti 2 AlN is a type of MAX phase, and its thin film has been successfully synthesized by physical vapor deposition (PVD) [10] or vacuum annealing (Ti+Al)/AlN multilayers [11]. In our previous work, a Ti 2 AlN thin film synthesized by the vacuum annealing of Ti/AlN multilayers deposited by HPPMS was shown to have a hardness of 32.5 ± 2.1 GPa [12]. In this work, we formed TiN/Ti 2 AlN multilayers by Coatings 2023, 13, 329 2 of 9 introducing Ti 2 AlN; this technique allowed us to study the potential of Ti 2 AlN for releasing the compressive residual stress of HPPMS-deposited TiN thin films.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Mechanical Properties of TiN/Ti2AlN Multilayers

Liu

Deng

et al. 2023

Coatings

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Titanium nitride (TiN) thin films deposited by high-power pulsed magnetron sputtering usually have a high compressive residual stress, which is not conducive for the adherence of TiN thin films. This study investigated the potential of Ti2AlN for releasing the compressive residual stress of HPPMS-deposited TiN thin films and evaluated the adherence strength and hardness of TiN/Ti2AlN multilayers by introducing the Ti2AlN MAX phase to form TiN/Ti2AlN multilayers. The results showed that smooth TiN/Ti2AlN multilayers with the TiN (111) and Ti2AlN (002) textures were successfully synthesized by HPPMS deposition and subsequent vacuum annealing. The compressive residual stress in TiN was released by Ti2AlN. The adherence strength of the TiN/Ti2AlN multilayers was improved after the release of the compressive residual stress, and the hardness of TiN/Ti2AlN multilayers was close to the annealed TiN. This study provides a novel approach for releasing the residual stress of hard ceramic thin films using the MAX phase.

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“…As an electrode layer material, metal Ti thin film can be used as an adhesive layer to reduce contact resistance, or as a barrier layer to block the diffusion between the silicon substrate and the connecting line [1]. At the same time, it can serve as a buffer layer to reduce the stress between the coating and the silicon substrate, and improve the adhesion between the film and the substrate [2,3]. However, the deposition sites of semiconductor materials are often irregular parts such as grooves.…”

Section: Introductionmentioning

confidence: 99%

The Deposition and Properties of Titanium Films Prepared by High Power Pulsed Magnetron Sputtering

Jiang,

Ma,

et al. 2023

Materials

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Titanium thin films are particularly important as electrode layers, barrier layers, or intermediate buffer layers in the semiconductor industry. In order to improve the quality of Ti thin films and the adhesion and diffraction abilities of irregular parts, this paper used high-power pulsed magnetron sputtering (HPPMS/HiPIMS) to prepare titanium thin films. The effects of different trigger voltages (700 V, 800 V, and 900 V) on plasma properties were studied, and the microstructure, mechanical properties and corrosion resistance of the films were also studied. The results showed that as the voltage increased, the grain size of the thin films gradually increased. The residual stress of the titanium films changed from compressive stress (−333 MPa) to tensile stress (55 MPa) and then to low compressive stress (−178 MPa). The hardness values were 13 GPa, 9.45 GPa and 6.62 GPa, respectively. The wear resistance of the films gradually decreased, while the toughness gradually increased. The corrosion resistance of the films decreased as well.

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Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers

Cited by 10 publications

References 43 publications

The effect of different annealing temperatures on the mechanical and tribological properties of the Ti₂AlN MAX phase films

The effect of different annealing temperatures on the mechanical and tribological properties of the Ti₂AlN MAX phase films

Microstructure and Mechanical Properties of TiN/Ti2AlN Multilayers

The Deposition and Properties of Titanium Films Prepared by High Power Pulsed Magnetron Sputtering

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Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers

Cited by 10 publications

References 43 publications

The effect of different annealing temperatures on the mechanical and tribological properties of the Ti2AlN MAX phase films

The effect of different annealing temperatures on the mechanical and tribological properties of the Ti2AlN MAX phase films

Microstructure and Mechanical Properties of TiN/Ti2AlN Multilayers

The Deposition and Properties of Titanium Films Prepared by High Power Pulsed Magnetron Sputtering

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The effect of different annealing temperatures on the mechanical and tribological properties of the Ti₂AlN MAX phase films

The effect of different annealing temperatures on the mechanical and tribological properties of the Ti₂AlN MAX phase films