Microstructure and Resistivity of Iridium Oxide Thin Films by Pulsed Laser Deposition Technique

Abstract

Highly conductive IrO2 thin films were prepared on Si (100) substrates by pulsed laser deposition technique from an iridium metal target in an oxygen ambient atmosphere. The effect of substrate temperature on the structure and electrical properties of IrO2 films was investigated. The deposited films at substrate temperatures ranging from 250 to 500°C under an oxygen pressure of 20Pa were pure polycrystalline tetragonal IrO2 and the preferential growth orientation changed with the substrate temperature. IrO2 films were well solidified with the fairly homogeneous thickness and exhibited a good adhesion with the substrate. The room-temperature resistivity of IrO2 films decreased with the increase of substrate temperature and the minimum resistivity of (42±6) μ-·cm was deposited at 500°C.

Surface characteristics and electrochemical corrosion behavior of NiTi alloy coated with IrO2

“…Materials Science and Engineering C 33 (2013) [15][16][17][18][19][20] It may be speculated that, during the heat treatment, most of the H 2 O, HCl, and Cl 2 , as decomposition products of H 2 IrCl 6 ·6H 2 O, evaporated into the air.…”

“…Consequently, it is an ideal coating materials for stents to potentially reduce the late in stent restenosis rates [15]. Iridium oxide coatings can be prepared by many different methods, for instance, by sol-gel process [16], pulsed laser deposition [17], sputtering [18] and so on. To our knowledge, no researches about the corrosion resistance of the NiTi alloy coated with IrO 2 were reported.…”