2024
DOI: 10.1016/j.apsusc.2024.159837
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Microstructure and room temperature ferromagnetism of double-layered MnxGe1−xTe polycrystalline modified by the space-layer thickness

Dingzhang Wu,
Chunjiang Lu,
Xinpeng He
et al.
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Cited by 1 publication
(2 citation statements)
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“…The Ge 3d 5/2 and Ge 3d 3/2 peaks appear at 29.70 and 30.28 eV, respectively, with a splitting value of 0.58 eV and an approximate peak area ratio of 3:2. The peaks at 31.15 and 32.78 eV correspond to Ge 2+ and Ge 4+ , respectively, due to surface oxidation. ,, The peaks for +4 or even a higher valence of Ge have been mentioned in several types of research studies about Mn x Ge 1– x materials, which can be attributed to the interaction between Ge atoms and Mn atoms during the sputtering process. ,, Thus, the appearance of the Ge–Ge bond and +4 valence of Ge demonstrate that the quantum dots deposited on the graphene substrate are mainly constructed by the Ge atoms and Mn atoms. The combination of Ge 4+ and Mn 2+ facilitates the formation of a p-type semiconductor through low-valence state substitutional doping of a high-valence state.…”
Section: Resultsmentioning
confidence: 97%
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“…The Ge 3d 5/2 and Ge 3d 3/2 peaks appear at 29.70 and 30.28 eV, respectively, with a splitting value of 0.58 eV and an approximate peak area ratio of 3:2. The peaks at 31.15 and 32.78 eV correspond to Ge 2+ and Ge 4+ , respectively, due to surface oxidation. ,, The peaks for +4 or even a higher valence of Ge have been mentioned in several types of research studies about Mn x Ge 1– x materials, which can be attributed to the interaction between Ge atoms and Mn atoms during the sputtering process. ,, Thus, the appearance of the Ge–Ge bond and +4 valence of Ge demonstrate that the quantum dots deposited on the graphene substrate are mainly constructed by the Ge atoms and Mn atoms. The combination of Ge 4+ and Mn 2+ facilitates the formation of a p-type semiconductor through low-valence state substitutional doping of a high-valence state.…”
Section: Resultsmentioning
confidence: 97%
“…This achievement established a robust foundation for realizing room temperature spintronic devices based on mainstream silicon technology. , Gao et al studied the effect of Co ion implantation on Ge 1– x Mn x films . Wu et al prepared double-layered Mn x Ge 1– x Te polycrystalline films by introducing a Si space layer, enhancing the magnetic properties of Mn x Ge 1– x Te . In addition, as a member of an asymmetric B20 crystal structure, the MnGe materials break the bulk inversion symmetry .…”
Section: Introductionmentioning
confidence: 99%