Microstructure characterization and deposition mechanism studies of ZrO2 thin films deposited by LI-MOCVD

Chen, Zhe; Prudhomme, Nathalie; Wang, Bin; Ribot, Patrick; Ji, Vincent

doi:10.1016/j.surfcoat.2012.12.017

Cited by 6 publications

(2 citation statements)

References 35 publications

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“…Tetragonal ZrO 2 is very common in MOCVD films, even though it is metastable at such temperatures. The stabilization of this phase is usually explained by fine crystallinity and low film thickness resulting in such deposition conditions that the nucleation rate exceeds the rate of surface diffusion [24]. According to EDS data, the Pb/Zr atomic ratio in the films is ∼ 1:25 (650 °C), 1:7 (700 °C), 1:4 (750 °C).…”

Section: Film Preparation and Examinationmentioning

confidence: 99%

MONITORING COMPOSITION AND STRUCTURE OF MOCVD ZrO2-BASED MULTICOMPONENT FILMS BY INNOVATIVE MIXED METAL-ORGANIC PRECURSORS

et al. 2020

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Three volatile mixed-metal precursors [ZrL 4 Pb(hfa) 2 ] (1), [ZrL 4 PbL 2 ] (2), and [ZrL 4 La(dpm) 3 ] (3) (L = 2methoxy-2,6,6-trimethyl-3,5-heptanedionate; dpm = 2,2,6,6-tetramethyl-3,5-heptanedionate; hfa = 1,1,1,5,5,5hexafluore-2,4-pentanedionate) are used to prepare ZrO 2 -based multicomponent films by metalorganic chemical vapor deposition (MOCVD). The deposition experiments are carried out in a hot-wall reactor at 600-750 °C on silicon substrates under 20 Torr in the presence of oxygen. According to X-ray powder diffraction, the main crystal phases in the films prepared from precursors 1 and 2 are solid solutions based on tetragonal and cubic ZrO2. Lead does not form separate crystal phases but is dissolved in the oxide form within the ZrO 2 matrix, as is indicated by X-ray photoelectron spectroscopy data. La 2 Zr 2 O 7 films are prepared from 3 using two ways of precursor supply: evaporation in argon and by direct liquid injection (DLI). It is shown that the composition and structure of obtained films are determined by the precursor composition. The results obtained for thermal behavior of precursors in condensed and gas phases are discussed.

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Section: Film Preparation and Examinationmentioning

confidence: 99%

MONITORING COMPOSITION AND STRUCTURE OF MOCVD ZrO2-BASED MULTICOMPONENT FILMS BY INNOVATIVE MIXED METAL-ORGANIC PRECURSORS

et al. 2020

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“…Therefore, thermal shock in the course of annealing can most often be avoided. To apply a thin layer of ZrO 2 on the 316L steel plate, the sol-gel method [14][15][16] can be employed; this is an inexpensive and efficient approach with a relatively low synthesis temperature and simple composition modification [17][18][19][20][21][22] compared with other vacuum deposition techniques [20][21][22][23][24][25][26]. In addition, the precursor solution must be prepared and then applied as a thin film onto a substrate.…”

Section: Introductionmentioning

confidence: 99%