Microstructure development in Cr–Al–Si–N nanocomposites deposited by cathodic arc evaporation

Rafaja, David; Dopita, Milan; Růžička, Milan; Klemm, Volker; Heger, D.; Schreiber, Gerhard; Šı́ma, M.

doi:10.1016/j.surfcoat.2006.05.033

Cited by 44 publications

(28 citation statements)

References 48 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…In the CAE process, the chemical composition of the thin films was adjusted through the positions of the samples in the deposition apparatus [5,13]. The arc current on the Cr cathode was 80 A, the arc current on the Al--Si and Al cathodes 120 A.…”

Section: Methodsmentioning

confidence: 99%

“…One of the important application fields of (Cr,Al,Si)N is the production of thin film nanocomposites for protection of tools used for punching of perforated sheets [1], forming dies [2], high end spindle bearings [3] and moulds. The benefit of the Cr--Al--Si--N thin film nanocomposites is their high hardness [4][5][6][7][8][9] and a good corrosion resistance [8,10,11]. The formation of Cr--Al--Si--N nanocomposites is facilitated by a limited solubility of aluminium and silicon in the elementary cell of CrN, which leads to the phase segregation and to the coexistence of Cr 1ÀxÀy Al x Si y N, AlN and silicon nitride in the nanocomposites.…”

Section: Introductionmentioning

confidence: 99%

“…Usually in the thin film nanocomposites, Cr 1ÀxÀy Al x Si y N is present in the face centred cubic (fcc) modification with the NaCl crystal structure, AlN in its thermodynamically stable wurtzite form (w-AlN) and silicon nitride as amorphous compound. Several microstructure models describing the formation of the Cr--Al--Si--N thin film nanocomposites were published in [4][5][6][12][13][14]. As the limited solubility of Al and Si in CrN plays a key role in the formation of the nanocomposites, also the maximum amount of Al and Si that can be accommodated in the elementary cell of fcc-CrN was the subject of many studies [5,[15][16][17][18][19][20][21].…”

Section: Introductionmentioning

confidence: 99%

“…the analysis of X-ray diffraction (XRD) patterns regarding the absence or presence of the diffraction lines from w-AlN) with the assessment of the lattice parameters of the fcc phase [5,6]. The latter approach assumes that, within the solubility range of both elements, the lattice parameter of fcc-Cr 1ÀxÀy Al x Si y N is a linear function of the aluminium and silicon contents in the thin film, aðfcc-Cr 1ÀxÀy Al x Si y NÞ ¼ aðCrNÞ À Da Al Á ½Al þ Da Si Á ½Si.…”

Section: Introductionmentioning

confidence: 99%

“…Typical difficulties of the precise determination of the lattice parameters in fcc-Cr 1ÀxÀy Al x Si y N arise from the presence of residual stresses in the thin films and from the strong crystallographic anisotropy of the elastic constants in fcc-Cr 1ÀxÀy Al x Si y N [5]. Furthermore, the comparison of results from literature suggests that the lattice parameter of fcc-Cr 1ÀxÀy Al x Si y N is affected by the deposition technique [6,18,20].…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Magnetic response of (Cr,Al,Si)N nanocrystallites on the microstructure of Cr—Al—Si—N nanocomposites

Rafaja¹,

Wüstefeld

Kutzner

et al. 2010

Zeitschrift für Kristallographie

View full text Add to dashboard Cite

Cathodic arc evaporation / Unbalanced magnetron sputtering / High power impulse magnetron sputtering / X-ray diffraction / Transmission electron microscopy / Ab initio calculations Abstract. A combination of microstructure analysis and ab initio calculations helped us to describe the interplay between the microstructure of Cr--Al--Si--N thin film nanocomposites and the ordering of the magnetic moments in the chromium-rich phase of (Cr,Al)N. The microstructure of the Cr--Al--Si--N nanocomposites was modified through the degree of ionisation of the deposited species in three physical vapour deposition processes -cathodic arc evaporation, unbalanced magnetron sputtering and high power impulse magnetron sputtering. According to the results of the ab initio calculations, the magnetic ordering was concluded from the expansion of the elementary cell and from the change of the crystal anisotropy of the elastic constants of (Cr,Al)N; these microstructure features were obtained from X-ray diffraction experiments. The microstructure of the Cr--Al--Si--N nanocomposites was furthermore characterised using the combination of X-ray diffraction and transmission electron microscopy with high resolution in order to obtain information about the phase composition of the thin films, distribution of individual elements and the crystallite size.

show abstract

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Magnetic response of (Cr,Al,Si)N nanocrystallites on the microstructure of Cr—Al—Si—N nanocomposites

Rafaja¹,

Wüstefeld

Kutzner

et al. 2010

Zeitschrift für Kristallographie

View full text Add to dashboard Cite

show abstract

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

2021

View full text Add to dashboard Cite

To increase the erosion and corrosion resistance of compressor blades, hard (Cr,Al,Si)N coatings are used. Physical vapor deposition (PVD) is a well‐known method for the deposition of nitride hard coatings. The application of pulse technique in power supply of conventional PVD technologies like magnetron sputtering shows a great potential for increasing the durability and lifetime of different tools and components. However, one disadvantage of conventional PVD is the line‐of‐sight characteristic. This is eliminated by means of the convection‐driven transport mechanism in high speed physical vapor deposition (HS‐PVD) technology, based on gas flow sputtering. Herein, the influence of gas flow sputtering with bipolar pulsed direct current (DC) power supply on coating properties and impact resistance of (Cr,Al,Si)N/substrate compound is investigated. Thereby, (Cr,Al,Si)N coatings are deposited onto X3CrNiMo13‐4 by HS‐PVD using continuous DC and bipolar pulsed DC supply. Nanoindentation analyses show an increase in indentation hardness using pulsed DC compared with continuous DC. Moreover, the lowest imprint depth and degree of cohesive and adhesive failures are observed in this case. These release a high potential for pulsed power supply in HS‐PVD, resulting in denser morphology, higher hardness and impact resistance compared with DC.

show abstract

Effect of Internal Interfaces on Hardness and Thermal Stability of Nanocrystalline Ti0.5Al0.5N Coatings

Rafaja

Wüstefeld

Baehtz

et al. 2010

Metall Mater Trans A

Self Cite

View full text Add to dashboard Cite

The effect of microstructure on the thermal stability and hardness of the cathodic arc evaporated Ti 0.5 Al 0.5 N coatings was investigated with the aid of the in-situ high-temperature X-ray diffraction experiments, which were accompanied by high-resolution transmission electron microscopy (HRTEM) and nanoindentation measurements. The microstructure of the coatings was modified through the choice of the bias voltage in the deposition process. It was found that the bias voltage affects strongly the uniformity of the local distribution of titanium and aluminum in the coatings. The nonuniform distribution of the elements contributes to the formation of lattice strains at the crystallite and phase boundaries. The lattice strains at the crystallite boundaries increase the hardness of the coatings; the lattice strains at the phase boundaries improve their thermal stability. A certain nonuniformity of the distribution of the metallic species in the coatings is regarded as advantageous. However, a great nonuniformity in the distribution of the metallic species accelerates the degradation of the coatings at high temperatures. As a measure for the nonuniformity of the distribution of the atomic species in the as-deposited (Ti, Al) N samples, the stress-free lattice parameter of fcc-(Ti, Al) N is suggested.

show abstract

Microstructure development in Cr–Al–Si–N nanocomposites deposited by cathodic arc evaporation

Cited by 44 publications

References 48 publications

Magnetic response of (Cr,Al,Si)N nanocrystallites on the microstructure of Cr—Al—Si—N nanocomposites

Magnetic response of (Cr,Al,Si)N nanocrystallites on the microstructure of Cr—Al—Si—N nanocomposites

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

Effect of Internal Interfaces on Hardness and Thermal Stability of Nanocrystalline Ti0.5Al0.5N Coatings

Contact Info

Product

Resources

About