Microstructure, mechanical and tribological behaviors of MoS2-Ti composite coatings deposited by a hybrid HIPIMS method

Qin, Xiaopeng; Ke, Peiling; Wang, Aiying; Kim, Kwang Ho

doi:10.1016/j.surfcoat.2013.04.040

Cited by 98 publications

(37 citation statements)

References 29 publications

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“…The measured values are similar to other studies for MoST coatings [42]. For hybrid MoS 2 /Ti coatings deposited using combined dc sputtered by high power impulse magnetron sputtering (HiPIMS) methods the reported CoF values between 0.05 and 0.23 depending on Ti content [43]. In the present study, the lowest CoF (equal to 0.07) was obtained for the sample at position b having a Ti content of around 28 at.…”

Section: Chemical Compositionsupporting

confidence: 90%

Hybrid Ti-MoS2 Coatings for Dry Machining of Aluminium Alloys

et al. 2017

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Combinatorial deposition, comprising filtered cathodic vacuum arc (FCVA) and physical vapor deposition (PVD) magnetron sputtering is employed to deposit molybdenum disulphide (MoS 2 ) and titanium (Ti) thin films onto TiB 2 -coated tool inserts specifically designed for the dry machining of aluminium alloys. Titanium is deposited by FCVA while MoS 2 is magnetron sputtered. The deposition set up allows several compositions of Ti-MoS 2 to be deposited simultaneously, with Ti content ranging between 5 and 96 at. %, and their machining performances to be evaluated. Milling took place using a CNC Vertical Machining Center at a 877 mm/min feed rate. The effect of different coating compositional ratios on the degree of aluminium sticking when a milling insert is used to face mill an Al alloy (SAE 6061) was investigated using a combination of energy-dispersive X-ray spectroscopy (EDX) and X-ray photoelectron spectroscopy (XPS) analysis. XPS studies suggest that the greater degree of Al sticking on the rake face of the inserts is due to the formation of greater amounts of non-protective Ti-O phases. EDX mapping of the milling inserts after machining reveal that a Ti:MoS 2 ratio of around 0.39 prevents Al from sticking to the tool edges. Since we prevent Al from sticking to the tool surface, the resultant machined surface finish is improved thus validating the machining performance of TiB 2 -coated tools using optimum compositions of Ti:MoS 2 thin film coatings.

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Section: Chemical Compositionsupporting

confidence: 90%

Hybrid Ti-MoS2 Coatings for Dry Machining of Aluminium Alloys

et al. 2017

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“…Fig. 1(b) shows the S 2p XPS spectra of the coatings with different carbon contents, which were fitted into four components, representing the MoS 2 structure (162.3 eV and 163.4 eV) and MoS (162.8 eV and 161.6 eV), respectively [15,26]. In Fig.…”

Section: Resultsmentioning

confidence: 99%

“…The Ti interlayer was deposited by HIPIMS using a Ti target. Details of the deposition system were described elsewhere [15]. All substrate including Si p (100) and mirror-finished high speed steel (HSS) were cleaned ultrasonically in acetone for 15 min and then dried in air.…”

Section: Preparation Of the Mos 2 -C Coatingsmentioning

confidence: 99%

“…High power impulse magnetron sputtering (HIPIMS) is a magnetron http://dx.doi.org/10.1016/j.apsusc.2015.01.057 0169-4332/© 2015 Elsevier B.V. All rights reserved. sputtering method developed in recent years [15], which exerts a pulsed and high power on targets [16]. HIPIMS could provide denser Ti interlayer than traditional magnetron deposition, due to the high sputtering particle ionization rate which is 2-3 orders of magnitude higher than that of conventional magnetron sputtering [17][18][19].…”

Section: Introductionmentioning

confidence: 99%

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Amorphous self-lubricant MoS2-C sputtered coating with high hardness

Zou

et al. 2015

Applied Surface Science

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“…Actually, in the applications of DC-HiPIMS system, the increase of DC current plays key role in both pre-ionization process and film structures. 29 In this paper, we focus the effects of superimposed DC current on HiPIMS discharge behaviors from target and substrate current waveforms characterization. In particular, the influence of direct current on the active species in HiPIMS plasma under various pulse voltage conditions are clarified.…”

Section: Introductionmentioning

confidence: 99%

The influence of superimposed DC current on electrical and spectroscopic characteristics of HiPIMS discharge

et al. 2018

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The electrical characteristics and spectroscopic properties have been comprehensively investigated in a DC superimposed high power impulse magnetron sputtering (DC-HiPIMS) deposition system in this paper. The influence of superimposed DC current on the variation of target and substrate current waveforms, active species and electron temperatures with pulse voltages are focused. The peak target currents in DC-HiPIMS are lower than in HiPIMS. The time scales of the two main discharge processes like ionization and gas rarefaction in DC-HiPIMS are analyzed. When the pulse voltage is higher than 600 V, the gas rarefaction effect becomes apparent. Overall, the ionization process is found to be dominant in the initial ∼100 μs during each pulse. The active species of Ar and Cr in DC-HiPIMS are higher than in HiPIMS unless that the pulse voltage reaches 900 V. However, the ionization degree in HiPIMS exceeds that in DC-HiPIMS at around 600 V. The electron temperature calculated by modified Boltzmann plot method based on corona model has a precipitous increase from 0.87 to 25.0 eV in HiPIMS, but varies mildly after the introduction of the superimposed DC current. Additionally, the current from plasma flowing to the substrate is improved when a DC current is superimposed with HiPIMS.

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Microstructure, mechanical and tribological behaviors of MoS2-Ti composite coatings deposited by a hybrid HIPIMS method

Cited by 98 publications

References 29 publications

Hybrid Ti-MoS2 Coatings for Dry Machining of Aluminium Alloys

Hybrid Ti-MoS2 Coatings for Dry Machining of Aluminium Alloys

Amorphous self-lubricant MoS2-C sputtered coating with high hardness

The influence of superimposed DC current on electrical and spectroscopic characteristics of HiPIMS discharge

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