2008
DOI: 10.1016/j.jallcom.2007.04.223
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Microstructure of gadolinium doped ceria oxide thin films formed by electron beam deposition

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Cited by 24 publications
(11 citation statements)
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“…NiO thin films can be fabricated by different physical and chemical vapor deposition methods, such as sputtering [2,13], reactive-pulsed laser deposition [14], electron beam evaporation [15,16], spray pyrolysis [17], electrochemical deposition [18], sol-gel [19], dip coating, spin coating, electro deposition [20]. In this paper, NiO thin films have been deposited on glass substrates using SILAR method for the first time.…”
Section: Introductionmentioning
confidence: 99%
“…NiO thin films can be fabricated by different physical and chemical vapor deposition methods, such as sputtering [2,13], reactive-pulsed laser deposition [14], electron beam evaporation [15,16], spray pyrolysis [17], electrochemical deposition [18], sol-gel [19], dip coating, spin coating, electro deposition [20]. In this paper, NiO thin films have been deposited on glass substrates using SILAR method for the first time.…”
Section: Introductionmentioning
confidence: 99%
“…Electron beams as PVD modification were used for deposition of alumina or composite cermets functional layers of carbides/nitrides (Singh & Wolfe, 2005). Only a few works mention e-beam as a promising approach to deposit thin and dense YSZ or GDC electrolyte layer on electrode (mainly NiO/YSZ anode ) (Laukaitis et al, 2007;Lemkey et al, 2005). Deposition through the vapor (PVD or CVD) ensures thin uniform layers but, unfortunately, this approach requires high vacuum that increases costs and reduces commercial usage.…”
Section: Wwwintechopencommentioning
confidence: 99%
“…NiO thin films can be fabricated by different chemical and physical methods such as chemical bath deposition [21], pulsed laser deposition [22,23], sputtering [24], evaporation [25], spray pyrolysis [26], electrochemical deposition [27], sol-gel [28,29], spin coating, atomic layer deposition [30] and oxidation of metallic Ni [31] Physical deposition of the NiO thin films etc. can be achieved [32].…”
Section: Introductionmentioning
confidence: 99%