Microstructure of hcp-Ni(11̄00)/bcc-Cr(211) Bi-layer Film Grown on MgO(110) Substrate

Ohtake, Mitsuru; Sato, Yoichi; Higuchi, Jumpei; Futamoto, Masaaki

doi:10.1088/1742-6596/266/1/012122

Cited by 8 publications

(10 citation statements)

References 12 publications

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“…The hcp structure in the Ni film is apparently transforming into more stable fcc structure through atomic displacement parallel to the hcp(0001) close-packed plane. The transformation behavior is similar to the cases of hcpNi(112 _ 0)/Au(100) [15] and hcp-Ni(11 _ 00)/Cr(211) [16] systems, though the underlayer is different. Figure 4 shows the film thickness dependence on the reflection intensity ratio of 033 _ 0 X-0 spot (spot-P) to 123 _ 0 X-0 spot (spot-Q), I spot-P /I spot-Q .…”

Section: Methodsmentioning

confidence: 52%

“…Ni is a typical soft magnetic material and its crystal structure is fcc up to the melting point in the bulk phase diagram. Ni epitaxial films with metastable bcc structure have been formed on GaAs substrates [9]- [11], whereas metastable hcp-Ni epitaxial films have been prepared on MgO [12,13], Au [14,15], Cr [16], and Ru [17] materials. However, these metastable crystals transformed into more stable fcc structure during film preparation processes and these films generally include a large volume of fcc phase.…”

Section: Introductionmentioning

confidence: 99%

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Structure analysis of Ni thin films epitaxially grown on bcc metal underlayers formed on MgO(100) substrates

Ohtake

Yanagawa

Higuchi

et al. 2013

EPJ Web of Conferences

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Abstract. Ni thin films are prepared on Cr, V, and Nb underlayers with bcc structure formed on MgO(100) single-crystal substrates by molecular beam epitaxy. The growth behavior and the crystallographic properties are investigated by in-situ reflection high-energy electron diffraction and pole-figure X-ray diffraction. Cr(100) and V(100) single-crystal underlayers grow epitaxially on the substrates, whereas an Nb epitaxial underlayer consisting of two bcc (110) variants is formed on the MgO(100) substrate. Metastable hcp-Ni(112 _ 0) crystals nucleate on the Cr and the V underlayers, where the metastable hcp structure is stabilized through heteroepitaxial growth. With increasing the film thickness, the hcp structure starts to transform into more stable fcc structure by atomic displacement parallel to the hcp(0001) close-packed plane. The resulting films are consisting of mixtures of hcp and fcc crystals. On the other hand, only the formation of fcc crystal is recognized for the Ni film grown on Nb(110) underlayer.

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Section: Methodsmentioning

confidence: 52%

Section: Introductionmentioning

confidence: 99%

Structure analysis of Ni thin films epitaxially grown on bcc metal underlayers formed on MgO(100) substrates

Ohtake

Yanagawa

Higuchi

et al. 2013

EPJ Web of Conferences

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“…On the contrary, metastable hcp (A3) phase has been recognized for Ni and Fe20Ni80 (at. %) films epitaxially grown on Cr [5][6][7][8][9] , V 9) , Au 10,11) , MgO 12,13) , and Ru 14) materials. Epitaxial thin film growth technique has a possibility in forming films with metastable structures.…”

Section: Introductionmentioning

confidence: 99%

“…Epitaxial thin film growth technique has a possibility in forming films with metastable structures. In our previous studies [6][7][8] , Ni and Fe20Ni80 films of 40 nm thickness were sputter-deposited on Cr(211) underlayers at room temperature (RT). The crystallographic property during film formation was investigated by in-situ reflection high-energy electron diffraction (RHEED).…”

Section: Introductionmentioning

confidence: 99%

Influence of Composition on the Crystal Structure of Fe-Ni Alloy Epitaxial Thin Film Deposited on Cr(211) Underlayer

et al. 2016

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Fe100-xNix (x = 0-100 at. %) alloy epitaxial films of 10 nm thickness are prepared on Cr(211) underlayers at room temperature by using a radio-frequency magnetron sputtering system. The film growth behavior and the crystallographic properties are investigated by in-situ reflection high-energy electron diffraction and pole-figure X-ray diffraction. bcc(211) crystal epitaxially nucleates on the underlayer for the Fe100-xNix films with x = 0-70 at. %. The bcc structure is stabilized up to 10 nm thickness for the compositional range of x = 0-50 at. %, whereas the Fe40Ni60 and the Fe30Ni70 crystals with bcc structure (x = 60-70 at. %) start to transform into fcc structure with increasing the thickness beyond 2 and 5 nm, respectively. The bcc-fcc phase transformation occurs through atomic displacements parallel to bcc(110) and bcc(101) close-packed planes which are 60° canted from the perpendicular direction. The crystallographic orientation relationship is similar to the Kurdjumov-Sachs relationship. When the x value is increased beyond 80 at. %, metastable hcp(11 _ 00) crystal coexists with bcc (211) crystal. The volume ratio of hcp to bcc crystal increases as the x value increases from 80 to 100 at. %. With increasing the thickness, the hcp crystal also starts to transform into fcc structure through atomic displacement parallel to hcp(0001) close-packed plane, which is similar to the case of bulk phase transformation in the Shoji-Nishiyama relationship.

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“…[11][12][13] However, massive studies of the epitaxial Fe, Co, and Ni ultrathin films suggest that the differences in crystal structures between film and substrate can lead to unpredictable fundamental magnetic properties. For instance, it has been proved experimentally that metastable bcc structure of Co [14][15][16] or Ni 17,18 and the hcp structure of Fe 19,20 or Ni [21][22][23] can be stabilized in ultrathin films, which are, however, difficult to achieve in bulk materials. The unstable crystal structures provide an extra degree of freedom to tailor film morphology and thus to improve the physical property.…”

mentioning

confidence: 99%

Predicting epitaxial orientations and lattice structure in ultrathin magnetic thin films

Wang

Shi

et al. 2016

APL Materials

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Metastable phases, such as bcc Co or Ni and hcp Fe or Ni, reportedly possess extraordinary magnetic properties for epitaxial ultra-thin films. To understand phase stability of these epitaxy-oriented phases upon substrate lattices, we calculated novel phase diagrams of Co, Fe, and Ni ultrathin films by considering the chemical free energy, elastic strain energy, and surface energy. Verified by experimental data in the literatures, the stable epitaxy-oriented phases are readily identified from the phase diagrams. The stabilization of these metastable phases is determined by the interplay between orientation-dependent elastic strain energy and surface energy.

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Microstructure of hcp-Ni(11̄00)/bcc-Cr(211) Bi-layer Film Grown on MgO(110) Substrate

Cited by 8 publications

References 12 publications

Structure analysis of Ni thin films epitaxially grown on bcc metal underlayers formed on MgO(100) substrates

Structure analysis of Ni thin films epitaxially grown on bcc metal underlayers formed on MgO(100) substrates

Influence of Composition on the Crystal Structure of Fe-Ni Alloy Epitaxial Thin Film Deposited on Cr(211) Underlayer

Predicting epitaxial orientations and lattice structure in ultrathin magnetic thin films

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