2000
DOI: 10.1016/s0040-6090(00)00971-8
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Microstructure of thermal hillocks on blanket Al thin films

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Cited by 82 publications
(39 citation statements)
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“…Such a behavior is frequently encountered for stressed aluminum and lead films, most of the time-but not always-at elevated temperature. [33][34][35] It is obviously caused by the compressive stress reached in the film upon unloading of the pressure, which induces the material to flow out of plane. Thicker films of about 300 nm thickness show extrusions forming inside very large grains [Figs.…”
Section: Microscopic Observationsmentioning
confidence: 99%
“…Such a behavior is frequently encountered for stressed aluminum and lead films, most of the time-but not always-at elevated temperature. [33][34][35] It is obviously caused by the compressive stress reached in the film upon unloading of the pressure, which induces the material to flow out of plane. Thicker films of about 300 nm thickness show extrusions forming inside very large grains [Figs.…”
Section: Microscopic Observationsmentioning
confidence: 99%
“…As mechanical stresses increase with decreasing geometrical or structural dimensions, the probability of stress-induced failure increases, which in turn can lead to the failure of microelectronic devices such as, for example, manifested in the formation of voids and hillocks on conductor lines in semiconductor devices [3] or passivation cracking due to a pile-up of dislocations at passivation layer interfaces [4].…”
Section: Introductionmentioning
confidence: 99%
“…It is well established that external compressive stresses (pressure up to 7,500 psi) can enhance tin whisker growth rate by factors as high as 10,000. [23][24][25] This observation indicates that compression stress induced by the mounting screw enhanced whisker formation. The other area is located in the corner of the sample.…”
Section: Whisker Development In CD 17 Ca 3 Single Crystalsmentioning
confidence: 85%