Microstructures and electrical properties of nanostructured Cr2O3 thin films deposited by dual-target reactive high-power impulse magnetron sputtering

Zhu, Mingdong; Li, Fēi; Zhou, Guangxue; Jin, Xiao; Wang, Langping; Song, Falun

doi:10.1016/j.vacuum.2019.03.035

Cited by 14 publications

(8 citation statements)

References 37 publications

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“…During heating in air at 300 • C or 500 • C, NiO crystallites enlarged slightly to 45 nm while the lattice constant decreased to a = 0.416 nm. Otherwise, no diffraction peaks were observed for the as-grown chromium oxide samples, indicating that they were amorphous as reported for analogous layers prepared at room temperature [25,26]. After heating at 300 • C or above, diffraction peaks evidenced hexagonal Cr 2 O 3 (JCPDS 72-3533) with a mean crystallite size of 55 nm and lattice parameters a = 0.492 nm and c = 1.359 nm.…”

Section: Resultsmentioning

confidence: 54%

Structural Changes Induced by Heating in Sputtered NiO and Cr2O3 Thin Films as p-Type Transparent Conductive Electrodes

Guillén

Herrero

2021

Electronic Materials

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NiO and Cr2O3 are transition metal oxides with a partially filled d electron band that supports p-type conduction. Both are transparent to the visible light due to optical absorption beginning at wavelengths below 0.4 μm and the creation of holes by metal vacancy defects. The defect and strain effects on the electronic characteristics of these materials need to be established. For this purpose, NiO and Cr2O3 thin films were deposited on unheated glass substrates by reactive DC sputtering from metallic targets. Their structural, morphological, optical and electrical properties were analyzed comparatively in the as-grown conditions (25 °C) and after heating in air at 300 °C or 500 °C. The cubic NiO structure was identified with some tensile strain in the as-grown conditions and compressive strain after heating. Otherwise, the chromium oxide layers were amorphous as grown at 25 °C and crystallized into hexagonal Cr2O3 at 300 °C or above also with compressive strain after heating. Both materials achieved the highest visible transmittance (72%) and analogous electrical conductivity (~10−4 S/cm) by annealing at 500 °C. The as-grown NiO films showed a higher conductivity (2.5 × 10−2 S/cm) but lower transmittance (34%), which were related to more defects causing tensile strain in these samples.

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Section: Resultsmentioning

confidence: 54%

Structural Changes Induced by Heating in Sputtered NiO and Cr2O3 Thin Films as p-Type Transparent Conductive Electrodes

Guillén

Herrero

2021

Electronic Materials

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“…It is worth noting that the voltage waveforms and electrode types used in flashover voltage testing in representative literatures selected for comparison are the same or similar to those in this study. Clearly, the cavity insulation structures exhibit ultra‐high surface insulation improvement ratio in both the cases of DC [26, 27, 46, 50–54] and impulse [24, 28, 35–38, 46, 55–59] flashover, which far outperform the other flashover mitigation strategies.…”

Section: Resultsmentioning

confidence: 99%

“…Comparatively, multipactor suppression is the more direct, effective, and frequently used strategy, which is based on the design principle to reduce the secondary electron yield (SEY) of the insulators and reduce the number of electrons available for SEEA. The SEY reduction approaches, including bulk insulation modification (e.g., chemical grafting [24,25], doping of functional fillers [26,27]) and surface treatment (e.g., fluorination [28,29], composite coating [30][31][32][33], plasma treatment [34][35][36], and thin film deposition [37,38]) have shown the ability of multipactor suppression to some extent. Nevertheless, most of these methods are collectively cumbersome and have poor mechanical stability.…”

Section: Introductionmentioning

confidence: 99%

Design and 3D printing of porous cavity insulation structure for ultra‐high electrical withstanding capability

et al. 2023

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Vacuum‐dielectric interface is the most vulnerable part of vacuum insulation systems where surface electrical breakdown is prone to happen, hence severely restricts the development of advanced electro‐vacuum devices with large capacity and its miniaturisation. Generally, a direct and effective way to improve vacuum surface insulation is to alleviate the initiation and development of multipactor phenomena. Inspired by this approach, the authors report a 3D‐printed insulation structure designed with a millimetre‐scale surface cavity covered by periodic through‐pore array via stereolithography, exhibiting remarkable multipactor suppression and flashover threshold improvement, well outperforming the conventional flashover mitigation strategies. Experiments and simulations demonstrate that electrons in the multipactor region pass through‐pores and are unlikely to escape from the cavity, hence no longer participate in the above‐surface multipactor process, and eventually improve flashover threshold. The proposed approach provides new inspiration for the design of advanced insulators featuring ultra‐high electrical withstanding capability and brings up new insight into pertinent industrial applications.

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“…Cr 2 O 3 coating was deposited in oxygen and argon environment fed to the chamber through a controlled flow injector maintaining a gas flow rate of 50 sccm for argon and 15 sccm for oxygen. Chromium (99.99% purity) bars were incorporated as the target in the deposition chamber 30 . The chamber pressure and substrate temperature were maintained at 0.3 Pa and 200°C, respectively.…”

Section: Methodsmentioning

confidence: 99%

“…Chromium (99.99% purity) bars were incorporated as the target in the deposition chamber. 30 The chamber pressure and substrate temperature were maintained at 0.3 Pa and 200 • C, respectively. The pulse duration was 30 μs, whereas a frequency of 200 Hz was set for the target.…”

Section: Substrate and Coatingsmentioning

confidence: 99%

Wear assessment of Cr₂O₃‐/TiAlN‐coated DAC‐10 tool steel against steel and Al₂O₃ counterbodies

Kumar

Maity

Patnaik

2021

Int J Applied Ceramic Tech

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TiAlN film was deposited on Cr2O3‐coated plasma‐nitrided DAC‐10 tool steel to obtained multilayer Cr2O3/TiAlN coating layer using cathodic arc deposition technique. The structural make‐up of the coating was characterized using Atomic Force Microscopy (AFM) and X‐ray diffraction methods, and the mechanical properties were evaluated using nanoindentation and nanoscratch test. The structural phases of the coating indicated the presence of crystalline CrO structure and cubic TiAlN phases. The coating showcased improved hardness (38 GPa), elastic modulus (387 GPa), and adhesion along with appreciable H/E (0.09) and H3/E2 (0.366 GPa) attributes. Further, friction‐induced wear behavior of the coating was investigated against steel and Al2O3 counterbodies under dry sliding conditions. The wear behavior of the coating was greatly influenced by its hardness and deformation properties and frictional behavior of the counterbodies. More spikes and fluctuation were observed in the frictional curve against Al2O3 counterbody attributed to the emanation of TiO2, Cr2O3, and Al2O3 compounds due to dry sliding leading to the formation of flakes and delamination induced debris. Against the steel counterbody, the coating mainly formed a typical smooth glossy surface ascribed to the formation of Fe2O3 compound on the worn surface.

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Microstructures and electrical properties of nanostructured Cr2O3 thin films deposited by dual-target reactive high-power impulse magnetron sputtering

Cited by 14 publications

References 37 publications

Structural Changes Induced by Heating in Sputtered NiO and Cr2O3 Thin Films as p-Type Transparent Conductive Electrodes

Structural Changes Induced by Heating in Sputtered NiO and Cr2O3 Thin Films as p-Type Transparent Conductive Electrodes

Design and 3D printing of porous cavity insulation structure for ultra‐high electrical withstanding capability

Wear assessment of Cr₂O₃‐/TiAlN‐coated DAC‐10 tool steel against steel and Al₂O₃ counterbodies

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Microstructures and electrical properties of nanostructured Cr2O3 thin films deposited by dual-target reactive high-power impulse magnetron sputtering

Cited by 14 publications

References 37 publications

Structural Changes Induced by Heating in Sputtered NiO and Cr2O3 Thin Films as p-Type Transparent Conductive Electrodes

Structural Changes Induced by Heating in Sputtered NiO and Cr2O3 Thin Films as p-Type Transparent Conductive Electrodes

Design and 3D printing of porous cavity insulation structure for ultra‐high electrical withstanding capability

Wear assessment of Cr2O3‐/TiAlN‐coated DAC‐10 tool steel against steel and Al2O3 counterbodies

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Product

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Wear assessment of Cr₂O₃‐/TiAlN‐coated DAC‐10 tool steel against steel and Al₂O₃ counterbodies