Microstructures and properties changes induced by a metal vapor vacuum arc chromium interlayer in chromium nitride films

Chen, Hongying; Han, Sheng; Shih, Han C.

doi:10.1016/j.matlet.2004.05.020

Cited by 15 publications

(4 citation statements)

References 27 publications

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“…Chang et al implanted Cr ions on the surface of CrN-coated steels by a MEVVA ion implanter [5]. Chen et al reported microstructures and properties changes induced by a MEVVA ion implanter implanted chromium interlayer in chromium nitride films [6]. In this paper, we report the experimental results on changes in the morphology and conductivity of 95% Al 2 O 3 ceramics and Si <100> crystal caused by implanting Ti ion with different fluences.…”

Section: Introductionmentioning

confidence: 88%

Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion

Yu³

et al. 2005

SSP

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95% Al2O3 ceramics and Si <100> crystal were implanted by Ti ion in a MEVVA implanter. The influence of implantation parameters was studied by varying ion fluence. The samples were implanted by 80 keV Ti ion with fluences from 1 x1015 to 1 x 1018 ions/cm2, respectively. The samples were investigated by SEM, SAM, and four-probe measurement. Differentmorphologies were observed on the surfaces of the samples due to irradiation damage, and clearly related to implantation parameters. XRD spectra confirm formation of titanium silicides on the surfaces of Si samples with ion fluences equal to or high than 1x1015 ions/cm2. The experimental results suggest that it is possible to synthesise titanium silicides by using a MEVVA implanter.

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Section: Introductionmentioning

confidence: 88%

Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion

Yu³

et al. 2005

SSP

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“…En los recubrimientos depositados por magnetron sputtering se puede distinguir un recubrimiento de CrN con espesor de ~0,5 µm y una intercara de cromo de 100 nm situada entre el recubrimiento y el substrato. Estudios recientes [19][20][21] , señalan la importancia de la existencia de dicha intercara de cromo debido a la reducción de las tensiones residuales que se originan durante la deposición hasta en un 65%, lo cual no modifica la microestructura cristalina del CrN pero proporciona tamaños de grano menores que mejoran las propiedades del material.…”

Section: Caracterizacion De Las Muestrasunclassified

Galvanostatic methods for stripping of crn coatings

et al. 2006

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La obtención de recubrimientos resistentes a la corrosión y al desgaste mediante técnicas de deposición en fase vapor se ha demostrado, desde el punto de vista de su aplicación industrial, como altamente competitiva. En concreto, la calidad de los recubrimientos obtenidos mediante deposición física en fase vapor (PVD) hace que su nicho de mercado aumente día a día, especialmente la protección de herramientas, matrices y moldes. Dado su alto coste, una vez terminado su ciclo de vida, se hace necesario volver a recubrirlos. Sin embargo, y como paso previo, es obligado eliminar totalmente los restos de recubrimiento que todavía pudieran quedar. Habitualmente, el volver a recubrir dichas piezas requiere la aplicación de métodos de eliminación con posibles efectos adversos sobre la herramienta que se desea volver a proteger. En el presente trabajo, se presenta un novedoso método de eliminación mediante técnicas electroquímicas; concretamente, la aplicación de métodos galvanostáticos-a intensidad constante-para la eliminación de recubrimientos de nitruro de cromo depositado mediante dos técnicas distintas de PVD: arco catódico y magnetron sputtering. La alta sensibilidad del método para detectar el punto final del decapado, la estructura del recubrimiento-distintas capas, espesor de las mismas, composición…-, así como el desarrollo del proceso en un tiempo relativamente corto confieren a esta técnica ciertas ventajas frente a los métodos químicos propuestos en la bibliografía. El bajo grado de ataque que exhibe el substrato, teniendo en cuenta la alta reactividad del mismo, hace posible pensar en futuras deposiciones de un nuevo recubrimiento sobre la pieza decapada.

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“…Chromium nitride (CrN) films possesses low friction coefficient, low wear rate and high corrosion resistance, enabling promising applications in metal forming, non-ferrous metal machining and injection molding [1][2][3]. CrN films have been deposited using various physical vapor deposition (PVD) processes, such as hollow cathode discharge [4], ion beam-assisted deposition [5], magnetron sputtering [6] and arc ion plating (AIP) [7].…”

Section: Introductionmentioning

confidence: 99%

CrN Films Deposited by Magnetic Field-enhanced Arc Ion Plating

Zhao¹,

Liu²,

Guo³

et al. 2017

dtetr

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CrN films were deposited on high-speed-steel (HSS) substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition and mechanical properties of the films. The film chemical composition, microstructure, surface morphology, surface roughness and hardness were investigated by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscope (SEM), Surface morphology analyzer and Viker microhardness test. The results showed that the N/Cr ratio increases when the magnetic field intensity increases from 0 to 30 mT. With increasing the magnetic field intensity, the film structures change in such way: Cr2N+CrCr2N+CrNCrN. The film micro hardness increases with the magnetic field intensity. 1

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Microstructures and properties changes induced by a metal vapor vacuum arc chromium interlayer in chromium nitride films

Cited by 15 publications

References 27 publications

Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion

Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion

Galvanostatic methods for stripping of crn coatings

CrN Films Deposited by Magnetic Field-enhanced Arc Ion Plating

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