2019
DOI: 10.1002/smll.201902612
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Microtopography‐Guided Radial Gradient Circle Array Film with Nanoscale Resolution

Abstract: report a microtopographic substrate guided strategy for controlling the distribution of multi-materials with an accuracy of up to ≈18 nm. For generalization, a mathematical model is developed to guide the distribution of position, size, shape, and type of material on an arbitrary section for the given morphology of the substrate.

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Cited by 4 publications
(2 citation statements)
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“…The structural error will result in high decrease in transmission. To overcome these drawbacks, a microtopography-guided method has been employed for multi-materials deposition reported by our group before [21] to prepare the double-layer cross structure. In brief, a VO 2 cross hollow structure (green part in Figure 3a) covered on the silicon substrate was prepared by a standard lithography and physical vapor deposition (PVD) process.…”
Section: Resultsmentioning
confidence: 99%
“…The structural error will result in high decrease in transmission. To overcome these drawbacks, a microtopography-guided method has been employed for multi-materials deposition reported by our group before [21] to prepare the double-layer cross structure. In brief, a VO 2 cross hollow structure (green part in Figure 3a) covered on the silicon substrate was prepared by a standard lithography and physical vapor deposition (PVD) process.…”
Section: Resultsmentioning
confidence: 99%
“…The structural error will result in a decrease in absorption. To overcome these drawbacks, a microtopographyguided method for multimaterial deposition reported by our group before 46 has been employed to prepare the chessboardlike Si and Ti structure. In brief, a bulk silicon substrate with column array on the surface (Figure 4a) was prepared by a standard lithography and reaction ion etching (RIE) process.…”
Section: Resultsmentioning
confidence: 99%