2000
DOI: 10.1111/j.1151-2916.2000.tb01400.x
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Mimicking Nanometer Atomic Processes on a Micrometer Scale via Electrophoretic Deposition

Abstract: The process of submonolayer formation during the electrophoretic deposition (EPD) of colloidal films of micrometersized (diameter Ϸ 0.5 m) silica particles on a silicon wafer has been observed as a function of deposition time. The process of nucleation and growth of the silica monolayer is compared with that of atomic film growth (10000 times smaller scale) via molecular-beam epitaxy (MBE), and for the first time, a striking similarity between the two growth processes is observed. Likewise in the atomic growth… Show more

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Cited by 25 publications
(21 citation statements)
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“…Regarding the growth of colloidal films during EPD, Sarkar et al 23 provided another fundamental study observing the deposition of silica particles on silicon wafers as a function of deposition time. They compared the nucleation and growth of the silica particle layer with that of atomic film growth via molecular-beam epitaxy and noticed a prominent similarity between the two processes.…”
Section: Novel Theories and Modelsmentioning
confidence: 99%
“…Regarding the growth of colloidal films during EPD, Sarkar et al 23 provided another fundamental study observing the deposition of silica particles on silicon wafers as a function of deposition time. They compared the nucleation and growth of the silica particle layer with that of atomic film growth via molecular-beam epitaxy and noticed a prominent similarity between the two processes.…”
Section: Novel Theories and Modelsmentioning
confidence: 99%
“…In particular related to the EPD of nanoparticles, a fundamental study on the formation of deposits during EPD has been provided by Sarkar et al. 15 They observed the deposition of silica particles on silicon wafers as a function of deposition time, and compared the nucleation and growth of the silica particle layer with that of atomic film growth via molecular-beam epitaxy. A striking similarity was found between the two growth processes.…”
Section: -7mentioning
confidence: 99%
“…Experimentally the coagulation was observed and measured in-situ [22][23][24][25]. But a better understanding of this mechanism is necessary to understand the self-organization of monosized SiO 2 particle layers [26]. This would be of great importance for the self-healing of faults during the deposition of thin dense layers.…”
Section: Introductionmentioning
confidence: 99%