IEEE Radio Frequency Integrated Circuits (RFIC) Symposium, 2006
DOI: 10.1109/rfic.2006.1651198
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Minimization of Via Count in Multiple-Metal Inductors: Performance Characterization and Physical Modelling

Abstract: High Q on-chip inductors are vital for modern RF ICs. A proven method of Q-enhancement is to use multiple metals stacked in a shunt manner, with a dense array of vias. The impact of fewer vias has not been investigated before. Here, we show that the same Q can be achieved with significantly fewer vias, thus simplifying the inductor layout. The traditional and new approaches are explained and physical models developed which give excellent agreement between simulations and measurements up to 6GHz.

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“…On the other hand, the vertical connections, denoted by VIA's in Fig. 5, through layers of inductor's metal electrodes and ground are employed to realize vertical connections, the effects of which on the imprecision of the overall inductance is reported limited to 0.15 %, (Murphy et al 2006). These three layers of electrodes for the inductor may induce additional vertical parasitic capacitances, which would not be harmful to the overall design if the capacitances are controlled within allowable limits that still lead to satisfactory bandwidths required by the circuit.…”
Section: Inductance Designmentioning
confidence: 99%
“…On the other hand, the vertical connections, denoted by VIA's in Fig. 5, through layers of inductor's metal electrodes and ground are employed to realize vertical connections, the effects of which on the imprecision of the overall inductance is reported limited to 0.15 %, (Murphy et al 2006). These three layers of electrodes for the inductor may induce additional vertical parasitic capacitances, which would not be harmful to the overall design if the capacitances are controlled within allowable limits that still lead to satisfactory bandwidths required by the circuit.…”
Section: Inductance Designmentioning
confidence: 99%