Technologies for Synthetic Environments: Hardware-in-the-Loop Testing X 2005
DOI: 10.1117/12.603972
|View full text |Cite
|
Sign up to set email alerts
|

MIRAGE: developments in IRSP systems, RIIC design, emitter fabrication, and performance

Abstract: SBIR's family of MIRAGE infrared scene projection systems is undergoing significant growth and expansion. The first two lots of production IR emitters have completed fabrication at Microelectronics Center of North Carolina/Research and Development Institute (MCNC-RDI), and the next round(s) of emitter production has begun. These latest emitter arrays support programs such as Large Format Resistive Array (LFRA), Optimized Array for Space-based Infrared Simulation (OASIS), MIRAGE 1.5, and MIRAGE II. We present t… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
4
0
2

Year Published

2006
2006
2020
2020

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(6 citation statements)
references
References 0 publications
0
4
0
2
Order By: Relevance
“…On the other hand, each micro-emitter unit cell in an array will have a slightly different input/output response relationship due to the inherent variability of the micro-fabrication processes. There are several factors in the resistor array fabrication runs, such as manufacturing inhomogeneities, etch non-uniformity, alternate reflector, connection between the pixel resistors and the electric drive nodes, semi-automatic wire bonding, the dead pixel occurrence and packaging process, are able to affect the uniformity of the resistor array device 23,24 . Especially for the advanced large format resistive array (1024×1024 or 1024×2048), the quality of micro-fabrication is a crucial factor of the uniformity.…”
Section: Non-uniformity Factorsmentioning
confidence: 99%
See 1 more Smart Citation
“…On the other hand, each micro-emitter unit cell in an array will have a slightly different input/output response relationship due to the inherent variability of the micro-fabrication processes. There are several factors in the resistor array fabrication runs, such as manufacturing inhomogeneities, etch non-uniformity, alternate reflector, connection between the pixel resistors and the electric drive nodes, semi-automatic wire bonding, the dead pixel occurrence and packaging process, are able to affect the uniformity of the resistor array device 23,24 . Especially for the advanced large format resistive array (1024×1024 or 1024×2048), the quality of micro-fabrication is a crucial factor of the uniformity.…”
Section: Non-uniformity Factorsmentioning
confidence: 99%
“…For a resistor array device with certain design and micro-fabrication technique, the non-uniformity induced by operation process of the projector, which is including but not limited to thermal/optical crosstalk, random noise, temporal drift in bias or gain response, the changing of surroundings temperature, and scene-dependent effects, should be considered as another significant factor which can affect the quality of the infrared scene [23][24][25][26][27][28] . After a long runtime, the changing of read-in drive signal, nonlinearity of the resistor array response and the non-uniformity of background voltage will change the uniformity of the device.…”
Section: Non-uniformity Factorsmentioning
confidence: 99%
“…Как представлено в работе [7], модулятор 8060-6439B (в дальнейшем будем использовать торговые обозначения модуляторов) был применен в ге-нераторе ИК изображений без какой-либо модификации. Это стало возмож-ным ввиду характера входных окон модуляторов.…”
Section: модернизация микрозеркального модулятора для генератора ик иunclassified
“…Ключевыми элементами этих стендов являются генераторы инфра-красных изображений, обеспечивающие формирование как тестовых изобра-жений, так и реальных динамических сцен [3]. В настоящее время наиболее распространенными в стендах динамической генерации ИК сцен являются тепловые источники излучения [4][5][6][7][8], которые пригодны для генерации сцен, моделирующих тела с равномерной излучающей способностью. Однако при моделировании излучающего тела необходимо задавать как яркость излуче-ния поверхностей, так и его спектральный состав [9,10].…”
Section: Introductionunclassified
“…In this letter, we examine whether conventional LEDs can form a platform for photonic MWIR DISP devices able to compete with advanced thermal microemitter technology 15,16 in testing and stimulating IR sensors, including forward-looking IR missile warning systems, IR search-and-track devices, and missile seekers. We also consider how they relate to the laser-based DISP technology which also worth to be mention even if not commercially realized yet.…”
Section: Introductionmentioning
confidence: 99%