Mist chemical vapor deposition of MoO2 thin films

Matamura, Yuya; Ikenoue, Takumi; Miyake, Masao; Hirato, Tetsuji

doi:10.1016/j.jcrysgro.2020.125862

Cited by 5 publications

(4 citation statements)

References 28 publications

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“…The chemical vapor deposition (CVD) method uses the chemical reaction of gaseous species to deposit thin solid films (Wang, Zhu, et al, 2020) and has been applied in photocatalyst film preparation. Examples include MoO 2 film (Matamura et al, 2020), MoO 2 /MoS 2 /TiO 2 sandwich heterostructure (Wang, Zhu, et al, 2020), and Fe 2 O 3 /2D graphene/Cu film (Polat, 2020).…”

Section: Methods Of Synthesismentioning

confidence: 99%

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Application of visible light active photocatalysis for water contaminants: A review

Sun

O’Connell

2022

Water Environment Research

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Organic water pollutants are ubiquitous in the natural environment arising from domestic products as well as current and legacy industrial processes. Many of these organic water pollutants are recalcitrant and only partially degraded using conventional water and wastewater treatment processes. In recent decades, visible light active photocatalyst has gained attention as a non‐conventional alternative for the removal of organic pollutants during water treatment, including industrial wastewater and drinking water treatment. This paper reviews the current state of research on the use of visible light active photocatalysts, their modified methods, efficacy, and pilot‐scale applications for the degradation of organic pollutants in water supplies and waste streams. Initially, the general mechanism of the visible light active photocatalyst is evaluated, followed by an overview of the major synthesis techniques. Because few of these photocatalysts are commercialized, particular attention was given to summarizing the different types of visible light active photocatalysts developed to the pilot‐scale stage for practical application and commercialization. The organic pollutant degradation ability of these visible light active photocatalysts was found to be considerable and in many cases comparable with existing and commercially available advanced oxidation processes. Finally, this review concludes with a summary of current achievements and challenges as well as possible directions for further research. Practitioner Points Visible light active photocatalysis is a promising advanced oxidation process (AOP) for the reduction of organic water pollutants. Various mechanisms of photocatalysis using visible light active materials are identified and discussed. Many recent photocatalysts are synthesized from renewable materials that are more sustainable for applications in the 21st century. Only a small number of pilot‐scale applications exist and these are outlined in this review.

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Section: Methods Of Synthesismentioning

confidence: 99%

“…Similarly, Kaur et al ( 2020 ) used rGO‐TiO 2 to remove triclosan totally in actual urban wastewater. In marine conservation, Qiu et al ( 2019 ) deposited the metal semiconductor (BiOI) on the expanded perlite (EP), which is able to degrade 86% of diesel‐contaminated seawater within 2 h.…”

Section: Water Contaminant Treatmentmentioning

confidence: 99%

Application of visible light active photocatalysis for water contaminants: A review

Sun

O’Connell

2022

Water Environment Research

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“…Particularly, monoclinic MoO 2 has confronted challenges in reliable deposition due to its metastable nature, thus potentially leading to the formation of more stable phases of MoO 3 or Mo 4 O 11 . To date, numerous studies have explored the fabrication of monoclinic MoO 2 films using a range of deposition methods, including pulsed laser deposition, reactive sputtering, and chemical vapor deposition. − Nevertheless, these deposition techniques are unsuitable for DRAM capacitor fabrication because of the requirement for conformal growth on a three-dimensional (3D) substrate with an exceptionally high aspect ratio. Consequently, the atomic layer deposition (ALD) process, which possesses precise thickness controllability, excellent uniformity, and conformality based on self-limiting surface reactions, should be utilized for the preparation of a MoO 2 electrode.…”

Section: Introductionmentioning

confidence: 99%

Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

Lee,

Kang,

Shin

et al. 2024

ACS Appl. Mater. Interfaces

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Dynamic random-access memory (DRAM) capacitor electrodes, exemplified by TiN, face performance limitations owing to their relatively low work functions in addition to the formation of a low-k interfacial layer caused by their insufficient chemical stability. With recent advances in device scaling, these issues have become increasingly problematic, prompting the exploration of alternative electrode materials to replace TiN. Molybdenum dioxide (MoO 2 ) has emerged as a promising candidate for this application, outperforming TiN due to its low resistivity, high work function (>5 eV), and excellent chemical stability. Moreover, monoclinic MoO 2 exhibits a distorted rutile structure, enabling the in situ growth of high-k rutile TiO 2 on MoO 2 at low deposition temperatures. However, MoO 2 deposition poses challenges because of its metastable nature compared to the more stable molybdenum oxide (MoO x ) phases, such as MoO 3 and Mo 4 O 11 . In this work, we successfully fabricated Sn-doped MoO x (TMO) films by atomic layer deposition (ALD) at 300 °C. A stabilized monoclinic MoO 2 phase was achieved using ALD by incorporating SnO x into MoO x on both SiO 2 and TiN substrates. The ALD TMO process comprised MoO x and SnO x subcycles, and the MoO x :SnO x subcycle ratio was varied from 100:1 to 20:1. High growth rates ranging from 0.19 to 0.34 nm/cycle were achieved for ALD TMO with varying the MoO x :SnO x subcycle ratio from 20:1 to 100:0. After post-deposition annealing at 500 °C, polycrystalline TMO films were obtained with smooth surface morphology. ALD TMO exhibited excellent interface quality with ALD TiO 2 , possessing a negligible low-k interfacial layer. Moreover, a rutile TiO 2 film with a high dielectric constant of 136 was successfully grown on a 20% Sn-TMO electrode. Overall, this study provides a strategy to stabilize metastable MoO 2 films using ALD, and it demonstrates the superiority of ALD TMO as a promising DRAM capacitor electrode material.

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“…There are several techniques to prepare CuInSe 2 thin films. Examples are: thermoreactive deposition (TRD), chemical vapor deposition (CVD) [10], electroplating [11][12][13], reactive spray deposition (Spray) [8], vacuum thermal evaporation deposition [8], reactive cathode sputtering (Sputtering) [14] and others. Best results were reported using the vacuum thermal evaporation technique [15] where the preferred orientation (112) is generally obtained [16][17][18].…”

Section: Introductionmentioning

confidence: 99%

Effect of feeding flow rate on characteristics of CuInSe2 films prepared by flash evaporation

2022

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Copper indium selenide CuInSe2 (CISe) is one of the most promising absorber materials in high efficiency heterojunction thin-film solar cells due to its high conversion efficiency and known high stability. This paper describes a simple method for preparing CuInSe2 films from pre-prepared CuInSe2 ingot powder using a flash evaporation method. The primary goal of this work is to investigate the effect of feeding flow rate on CuInSe2 film characteristics. The powder feeding flow rate into the evaporator has been adjusted to control the film growth rate. Structure, composition, morphology, electrical and optical properties have all been studied for films deposited at different feeding flow rates. The results show that varying the feeding flow rate affects film characteristics, and that lower feeding rates yield films with better characteristics, which should be considered in future semiconductor film processing.

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Mist chemical vapor deposition of MoO2 thin films

Cited by 5 publications

References 28 publications

Application of visible light active photocatalysis for water contaminants: A review

Application of visible light active photocatalysis for water contaminants: A review

Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

Effect of feeding flow rate on characteristics of CuInSe2 films prepared by flash evaporation

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