Mitigating graphene etching on SiO2 during fluorination by XeF2

Copetti, Gabriela; Nunes, Eduardo H.M.; Soares, Gabriel Vieira; Radtke, C.

doi:10.1016/j.matlet.2019.05.086

Cited by 3 publications

(2 citation statements)

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“…[ 11 , 12 , 13 , 14 , 15 , 16 ]. It is also used for the preparation of fluorographenes [ 17 , 18 , 19 ]. Its applicability for low-temperature insertion of fluorine into oxides systems has been demonstrated with the purpose of modification of magnetic and electronic properties, in particular superconductivity [ 20 ].…”

Section: Xenonmentioning

confidence: 99%

Noble-Gas Chemistry More than Half a Century after the First Report of the Noble-Gas Compound

Mazej

2020

Molecules

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Recent development in the synthesis and characterization of noble-gas compounds is reviewed, i.e., noble-gas chemistry reported in the last five years with emphasis on the publications issued after 2017. XeF2 is commercially available and has a wider practical application both in the laboratory use and in the industry. As a ligand it can coordinate to metal centers resulting in [M(XeF2)x]n+ salts. With strong Lewis acids, XeF2 acts as a fluoride ion donor forming [XeF]+ or [Xe2F3]+ salts. Latest examples are [Xe2F3][RuF6]·XeF2, [Xe2F3][RuF6] and [Xe2F3][IrF6]. Adducts NgF2·CrOF4 and NgF2·2CrOF4 (Ng = Xe, Kr) were synthesized and structurally characterized at low temperatures. The geometry of XeF6 was studied in solid argon and neon matrices. Xenon hexafluoride is a well-known fluoride ion donor forming various [XeF5]+ and [Xe2F11]+ salts. A large number of crystal structures of previously known or new [XeF5]+ and [Xe2F11]+ salts were reported, i.e., [Xe2F11][SbF6], [XeF5][SbF6], [XeF5][Sb2F11], [XeF5][BF4], [XeF5][TiF5], [XeF5]5[Ti10F45], [XeF5][Ti3F13], [XeF5]2[MnF6], [XeF5][MnF5], [XeF5]4[Mn8F36], [Xe2F11]2[SnF6], [Xe2F11]2[PbF6], [XeF5]4[Sn5F24], [XeF5][Xe2F11][CrVOF5]·2CrVIOF4, [XeF5]2[CrIVF6]·2CrVIOF4, [Xe2F11]2[CrIVF6], [XeF5]2[CrV2O2F8], [XeF5]2[CrV2O2F8]·2HF, [XeF5]2[CrV2O2F8]·2XeOF4, A[XeF5][SbF6]2 (A = Rb, Cs), Cs[XeF5][BixSb1-xF6]2 (x = ~0.37–0.39), NO2XeF5(SbF6)2, XeF5M(SbF6)3 (M = Ni, Mg, Zn, Co, Cu, Mn and Pd) and (XeF5)3[Hg(HF)]2(SbF6)7. Despite its extreme sensitivity, many new XeO3 adducts were synthesized, i.e., the 15-crown adduct of XeO3, adducts of XeO3 with triphenylphosphine oxide, dimethylsulfoxide and pyridine-N-oxide, and adducts between XeO3 and N-bases (pyridine and 4-dimethylaminopyridine). [Hg(KrF2)8][AsF6]2·2HF is a new example of a compound in which KrF2 serves as a ligand. Numerous new charged species of noble gases were reported (ArCH2+, ArOH+, [ArB3O4]+, [ArB3O5]+, [ArB4O6]+, [ArB5O7]+, [B12(CN)11Ne]−). Molecular ion HeH+ was finally detected in interstellar space. The discoveries of Na2He and ArNi at high pressure were reported. Bonding motifs in noble-gas compounds are briefly commented on in the last paragraph of this review.

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Section: Xenonmentioning

confidence: 99%

Noble-Gas Chemistry More than Half a Century after the First Report of the Noble-Gas Compound

Mazej

2020

Molecules

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“…Along similar veins, the methods for synthesizing fluorinated graphene, which has been cited in a few reports, are generally categorized into two groups: (I) Exfoliation methods that include thermal exfoliation [7,8], modified Hummer's exfoliation [9], and sonochemical exfoliation [10], all of which employ the commercially available graphite fluoride (GrF) powders along with severe reaction conditions, that could inevitably destroy a portion of C-F bonds in the fluorinated graphene [11]. (II) Direct graphene fluorination method which has been achieved through utilizing a variety of reactions such as fluorination gas [12,13], plasma fluorination [14], photochemical/electrochemical synthesis [15], and hydrothermal fluorination [16][17][18][19][20], all of which require high thermal treatment temperature and yield a low F content [21]. Therefore, the progress of a safe, secure, low-cost, and effective synthesis route of FG with adaptive F/C atomic ratio is of high demand.…”

Section: Introductionmentioning

confidence: 99%