J. Micro/Nanopattern. Mats. Metro.
 2024
DOI: 10.1117/1.jmm.23.3.034603
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Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse process

Seonggil Heo,
Seungjoo Baek,
Mihir Gupta
et al.
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