2004
DOI: 10.1017/s1431927604884575
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Mitigation of Localized Charging Induced in Insulating Materials by a Focused Ion Beam

Abstract: Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

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“…16,17 A high signal-to-noise ͑S/N͒ ratio for emitted SEs is also important for high-quality image acquisition. If the sample is an insulator, SEM and SGIM may therefore lead to important charging effects in the sample as charge builds up on the surface.…”
Section: B Limiting Factors In Imaging Resolution and Contrastmentioning
confidence: 99%
“…16,17 A high signal-to-noise ͑S/N͒ ratio for emitted SEs is also important for high-quality image acquisition. If the sample is an insulator, SEM and SGIM may therefore lead to important charging effects in the sample as charge builds up on the surface.…”
Section: B Limiting Factors In Imaging Resolution and Contrastmentioning
confidence: 99%