2011
DOI: 10.1103/physrevb.83.235327
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Mn incorporation into the GaAs lattice investigated by hard x-ray photoelectron spectroscopy and diffraction

Abstract: Photoelectron spectroscopy and diffraction have been used to investigate structural changes during the annealing process of Ga 1−x Mn x As samples. Hard x-ray radiation helped in observing photoelectron core-level spectra and electron diffraction from the bulk underlying the oxidized surface layer. High electron-energy resolution enabled us to separate the components due to substitutional and interstitial Mn atoms in the intrinsic Mn 2p 3/2 photoemission profile, resulting in two peaks at 638.8 and 639.5 eV bi… Show more

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Cited by 12 publications
(5 citation statements)
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“…In particular, core level photoemission combined with configuration-interaction cluster calculations were used to address the Mn valence and the p-d interaction between Mn impurity and host semiconductors [40]. Since these early experimental reports, many efforts have been focused on reaching a reliable control of surface and interface effects by means of standard surface preparation methods, e.g., sputtering and annealing [26,[97][98][99][100][101]; this is mainly due to the extreme surface sensitivity of PES, which for typical XPS photon energies (∼50-800 eV) results in a probing depth less than 10 Å (see figure 2). In recent years, hard x-ray PES (HAXPES) has become a new tool for the analysis of bulk electronic properties: it offers an information depth of more than 6 nm for electron kinetic energy above 5 keV, corresponding to bulk sensitivity [102,103], thus reducing the uncertainties connected to surface preparation.…”
Section: Core Level Pesmentioning
confidence: 99%
“…In particular, core level photoemission combined with configuration-interaction cluster calculations were used to address the Mn valence and the p-d interaction between Mn impurity and host semiconductors [40]. Since these early experimental reports, many efforts have been focused on reaching a reliable control of surface and interface effects by means of standard surface preparation methods, e.g., sputtering and annealing [26,[97][98][99][100][101]; this is mainly due to the extreme surface sensitivity of PES, which for typical XPS photon energies (∼50-800 eV) results in a probing depth less than 10 Å (see figure 2). In recent years, hard x-ray PES (HAXPES) has become a new tool for the analysis of bulk electronic properties: it offers an information depth of more than 6 nm for electron kinetic energy above 5 keV, corresponding to bulk sensitivity [102,103], thus reducing the uncertainties connected to surface preparation.…”
Section: Core Level Pesmentioning
confidence: 99%
“…Due to the significant influence of growth conditions 44 and surface cleanliness on the experimental spectra of (Ga,Mn)As, previous studies resulted in contradicting conclusions 17,39,45 , which were partly explained in Refs. 46,47 by the surface decomposition during annealing and by the high reactivity of Mn 48,49 .…”
Section: Sample Preparation and Experimental Methodsmentioning
confidence: 99%
“…Due to the significant influence of growth conditions [44] and surface cleanliness on the experimental spectra of (Ga,Mn)As, previous studies resulted in contradicting conclusions [17,39,45], which were partly explained in Refs. [46,47] by the surface decomposition during annealing and by the high reactivity of Mn [48,49].…”
Section: Figmentioning
confidence: 99%