2004
DOI: 10.1557/mrs2004.164
|View full text |Cite
|
Sign up to set email alerts
|

MOCVD-Based YBCO-Coated Conductors

Abstract: Metalorganic chemical vapor deposition (MOCVD) is a well-developed deposition process that shows great promise for scaling up the production of high-temperature superconductors (HTSs) to quickly fabricate useful lengths of superconducting tapes and wires.The primary advantage of MOCVD is its potential for high tape throughput, a key factor in determining the cost of second-generation HTS tapes.This article details progress in long-length HTS tape fabrication, high-throughput processing, and techniques to impro… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

0
72
0

Year Published

2005
2005
2024
2024

Publication Types

Select...
9
1

Relationship

4
6

Authors

Journals

citations
Cited by 97 publications
(72 citation statements)
references
References 20 publications
0
72
0
Order By: Relevance
“…In the MOCVD process, tetramethyl heptanedionate (thd) precursors were vaporized from a solution and the vapors were injected over the deposition area in a carrier gas of Ar. 25 Substrate temperature of 800 to 850°C and reactor pressure of 2 to 3 Torr were used. Zr was added in form of Zr(thd) 4 to the rest of the precursors in amounts ranging from 5 to 10 atom %.…”
Section: Methodsmentioning
confidence: 99%
“…In the MOCVD process, tetramethyl heptanedionate (thd) precursors were vaporized from a solution and the vapors were injected over the deposition area in a carrier gas of Ar. 25 Substrate temperature of 800 to 850°C and reactor pressure of 2 to 3 Torr were used. Zr was added in form of Zr(thd) 4 to the rest of the precursors in amounts ranging from 5 to 10 atom %.…”
Section: Methodsmentioning
confidence: 99%
“…[9]. A solution of tetramethyl heptanedionate (thd) precursors of Y, Gd, Ba, and Cu is flash vaporized at about 270°C and vapors are transported to the reactor in a carrier gas of Ar.…”
Section: Methodsmentioning
confidence: 99%
“…MOCVD using a liquid precursor delivery system was used to grow (Gd,Y)BaCuO films with 25% Zr addition. 22 Standard tetramethyl heptanedionate (thd) precursors were used for all components including Zr. The deposition rate of the film was approximately 0.1 lm/min controlled by the precursor molarity and precursor flow rate.…”
mentioning
confidence: 99%