2017
DOI: 10.1109/tasc.2017.2660768
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MOCVD of Heavily-Doped 25 mol.% Zr-Added (Gd, Y)Ba2Cu3O7-δ Coated Conductors

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Cited by 15 publications
(6 citation statements)
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“…While in-plane mismatch accommodation is the focus of this study, the elastic mismatch along the REBCO c-axis is an equally important aspect of film growth and nanorod self-assembly. We have reported earlier that the same metric, (Ba + Zr)/Cu, has a considerable effect on c-axis lattice mismatch between BZO and REBCO [48,61,63]. Multiple studies have reported presence of dense arrays of REBCO 124/248 type, 223 and other stacking faults [54,[83][84][85][86][87][88][89][90][91], and we have regularly observed the same features, as can also be seen in figure 2(d).…”
Section: In-plane Strain Accommodationsupporting
confidence: 84%
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“…While in-plane mismatch accommodation is the focus of this study, the elastic mismatch along the REBCO c-axis is an equally important aspect of film growth and nanorod self-assembly. We have reported earlier that the same metric, (Ba + Zr)/Cu, has a considerable effect on c-axis lattice mismatch between BZO and REBCO [48,61,63]. Multiple studies have reported presence of dense arrays of REBCO 124/248 type, 223 and other stacking faults [54,[83][84][85][86][87][88][89][90][91], and we have regularly observed the same features, as can also be seen in figure 2(d).…”
Section: In-plane Strain Accommodationsupporting
confidence: 84%
“…In the following, we present the composition as (Ba + Zr)/Cu ratio, for the reasons of the previously found strong correlation of in-field performance and other characteristics with this metric, as well as for easy cross-comparisons [15,48,61]. The fully compensated case corresponds to (Ba + Zr)/Cu = (2.15 + 0.15)/3 = 0.767, and the examined samples can be thought of as samples centered around nominal composition of RE 1.3 Ba 2+x Cu 3 + 0.15 Zr, with variation in Ba excess/deficiency content, x.…”
Section: Resultsmentioning
confidence: 99%
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“…One particular aspect of interest was maximizing the lift factor (LF), defined as the ratio of I c at desired temperature/field and I c value at 77 K, self-field itself 1215 . Extensive optimization of the REBCO-BZO system has been done using MOCVD, in terms of dopant concentration, film microstructure, growth conditions and composition to achieve high in-field performance 13,1618 . However, common to most REBCO film growth techniques, J c was typically found to strongly deteriorate with thickness 1921 .…”
Section: Introductionmentioning
confidence: 99%
“…CVD, especially metal–organic CVD (MOCVD) method, is widely used in the semiconductor industry and high‐temperature superconductors for the growth of thin films of inorganic materials. Uniformity, thickness control, purity, and systematic control over material properties through process conditions are major factors for the broad adoption of this approach.…”
Section: Optimizing the Properties Of Ocvd Cpmentioning
confidence: 99%