Atomic
layer deposition is an appealing deposition technology for
the fabrication of protective coatings for various applications, including
semiconductor manufacturing chambers and related metallic parts with
complex three-dimensional topographies, where a key requirement is
(thermo)mechanical robustness of the coatings. Here, we study the
mechanical properties of atomic-layer-deposited Al2O3, Y2O3, and their nanolaminate (NL)
coatings on an Al metal substrate. Tensile straining experiments accompanied
by in situ optical and scanning electron microscopy indicate that
the fragmentation onset of 100 nm thick coatings can be tailored in
the strain range of 1.3–2.1% by controlling the layer structure
and composition of the NLs, such that a higher Al2O3 content, denser layer spacing, and amorphization favor higher
crack onset strain. Although the fracture toughness of Al2O3 and Y2O3 is found to be similar, K
IC = 1.3 MPa·m1/2, the (substantially
tensile) intrinsic residual stress for Y2O3 is
a disadvantage for applications, where applied tensile stresses are
to be expected. The films adhere well to the Al substrate as significant
delamination of the films is not observed in the tensile experiments;
the analysis of the fragmentation patterns indicates that insertion
of an Al2O3 layer at the film/substrate interface
can enhance the interface toughness. High-temperature (425 °C)
tensile experiments for the Al2O3 films indicate
good temperature tolerance for the coatings, and in comparison to
the room-temperature data, a significant difference is seen in the
increase of saturation crack spacing. Moreover, the structure and
composition of the films are studied in detail through X-ray reflection
and diffraction, transmission electron microscopy, Rutherford backscattering
spectrometry, and elastic recoil detection analysis. The results are
particularly interesting for protective coating applications.